Frontiers of Mechanical Engineering >

2006 , Vol. 1 >Issue 2: 157 - 161

DOI: https://doi.org/10.1007/s11465-006-0014-2

A nano-scale alignment method for imprint lithography

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  • The State-key Lab of Manufacturing Systems Engineering, Xi′an Jiaotong University, Xi′an 710049, China;

Published date: 05 Jun 2006

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Abstract

A novel nano-scale alignment technique based on moiré signal for room-temperature imprint lithography in the submicron realm is proposed. The moiré signals generated by two pairs of quadruple gratings on mold and wafer are optically projected onto two photo-detector arrays, then the detected moiré signals are used to estimate the alignment errors in the x and y directions. The experiment results indicate that complex differential moiré signal is sensitive to relative displacement of the mold and wafer, and the alignment accuracy obtained in the x and γ directions and in θ are ±20 nm , ±25 nm and ±1 μrad (3σ), respectively. They can meet the requirements of alignment accuracy for submicron imprint lithography.

Cite this article

WANG Li, LU Bing-heng, DING Yu-cheng, QIU Zhi-hui, LIU Hong-zhong . A nano-scale alignment method for imprint lithography[J]. Frontiers of Mechanical Engineering, 2006 , 1(2) : 157 -161 . DOI: 10.1007/s11465-006-0014-2

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