Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer

{{article.zuoZheEn}}

PDF(2954 KB)
PDF(2954 KB)
Front. Mech. Eng. ›› 2024, Vol. 19 ›› Issue (4) : 24. DOI: 10.1007/s11465-024-0795-1
RESEARCH ARTICLE

Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer

  • {{article.zuoZheEn}}
Author information +
History +

Highlights

{{article.highlightEn}}

Abstract

{{article.abstractEn}}

Author summary

{{article.authorSummayEn}}

Graphical abstract

Keywords

Cite this article

EndNote

Ris (Procite)

Bibtex

Download citation ▾
{{article.zuoZheEn_L}}. {{article.titleEn}}. Front. Mech. Eng., 2024, 19(4): 24 https://doi.org/10.1007/s11465-024-0795-1

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

{{article.reference}}

RIGHTS & PERMISSIONS

{{article.copyright.year}} {{article.copyright.holder}}
PDF(2954 KB)

Accesses

Citations

Detail
Sections
Recommended

/

〈 〉