A review of the scalable nano-manufacturing technology for flexible devices

Wenbin HUANG , Xingtao YU , Yanhua LIU , Wen QIAO , Linsen CHEN

Front. Mech. Eng. ›› 2017, Vol. 12 ›› Issue (1) : 99 -109.

PDF (477KB)
Front. Mech. Eng. ›› 2017, Vol. 12 ›› Issue (1) : 99 -109. DOI: 10.1007/s11465-017-0416-3
REVIEW ARTICLE
REVIEW ARTICLE

A review of the scalable nano-manufacturing technology for flexible devices

Author information +
History +
PDF (477KB)

Abstract

Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained considerable commercial and scientific interest in the academe and in industries. However, low-cost and high-throughput nano-manufacturing is difficult to realize with the use of traditional photolithographic processes. In this review, we summarize the status and the limitations of current nano-patterning techniques for scalable and flexible functional devices in terms of working principle, resolution, and processing speed. Finally, several remaining unsolved problems in nano-manufacturing are discussed, and future research directions are highlighted.

Keywords

flexible nano-manufacturing / flexible devices / nanofabrication / scalability

Cite this article

Download citation ▾
Wenbin HUANG, Xingtao YU, Yanhua LIU, Wen QIAO, Linsen CHEN. A review of the scalable nano-manufacturing technology for flexible devices. Front. Mech. Eng., 2017, 12(1): 99-109 DOI:10.1007/s11465-017-0416-3

登录浏览全文

4963

注册一个新账户 忘记密码

References

[1]

Fan X, Zhang H, Liu S, . NIL—A low-cost and high-throughput MEMS fabrication method compatible with IC manufacturing technology. Microelectronics Journal, 2006, 37(2): 121–126

[2]

Yu Z, Duong B, Abbitt D, . Highly ordered MnO2 nanopillars for enhanced supercapacitor performance. Advanced Materials, 2013, 25(24): 3302–3306

[3]

Guo L J. Nanoimprint lithography: Methods and material requirements. Advanced Materials, 2007, 19(4): 495–513

[4]

Gates B D, Xu Q, Stewart M, . New approaches to nanofabrication: molding, printing, and other techniques. Chemical Reviews, 2005, 105(4): 1171–1196

[5]

Guo L J. Recent progress in nanoimprint technology and its applications. Journal of Physics D: Applied Physics, 2004, 37(11): R123–R141

[6]

Kazemi A, He X, Alaie S, . Large-area semiconducting graphene nanomesh tailored by interferometric lithography. Scientific Reports, 2015, 5: 11463

[7]

Checco A, Rahman A, Black C T. Robust superhydrophobicity in large-area nanostructured surfaces defined by block-copolymer self assembly. Advanced Materials, 2014, 26(6): 886–891

[8]

Gale M T, Rossi M, Pedersen J, . Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists. Optical Engineering, 1994, 33(11): 3556–3566

[9]

Hon K, Li L, Hutchings I. Direct writing technology—Advances and developments. CIRP Annals—Manufacturing Technology, 2008, 57(2): 601–620

[10]

Biswas A, Bayer I S, Biris A S, . Advances in top-down and bottom-up surface nanofabrication: Techniques, applications & future prospects. Advances in Colloid and Interface Science, 2012, 170(1‒2): 2–27

[11]

Gratton S E A, Williams S S, Napier M E, . The pursuit of a scalable nanofabrication platform for use in material and life science applications. Accounts of Chemical Research, 2008, 41(12): 1685–1695

[12]

Tseng A A, Jou S, Notargiacomo A, . Recent developments in tip-based nanofabrication and its roadmap. Journal of Nanoscience and Nanotechnology, 2008, 8(5): 2167–2186

[13]

Supran G J, Shirasaki Y, Song K W, . QLEDs for displays and solid-state lighting. MRS Bulletin, 2013, 38(09): 703–711

[14]

Lim S K, Perrier S, Neto C. Patterned chemisorption of proteins by thin polymer film dewetting. Soft Matter, 2013, 9(9): 2598–2602

[15]

Benor A, Hoppe A, Wagner V, . Microcontact printing and selective surface dewetting for large area electronic applications. Thin Solid Films, 2007, 515(19): 7679–7682

[16]

Gout S, Coulm J, Léonard D, . Silver localization on polyimide using microcontact printing and electroless metallization. Applied Surface Science, 2014, 307: 716–723

[17]

Mondin G, Schumm B, Fritsch J, . Fabrication of micro-and submicrometer silver patterns by microcontact printing of mercaptosilanes and direct electroless metallization. Microelectronic Engineering, 2013, 104: 100–104

[18]

King E, Xia Y, Zhao X M, . Solvent-assisted microcontact molding: A convenient method for fabricating three-dimensional structures on surfaces of polymers. Advanced Materials, 1997, 9(8): 651–654

[19]

Wan W, Qiao W, Huang W, . Efficient fabrication method of nano-grating for 3D holographic display with full parallax views. Optics Express, 2016, 24(6): 6203–6212

[20]

Park S R, Kwon O J, Shin D, . Grating micro-dot patterned light guide plates for LED backlights. Optics Express, 2007, 15(6): 2888–2899

[21]

Lee C K, Wu J W J, Yeh S L, . Optical configuration and color-representation range of a variable-pitch dot matrix holographic printer. Applied Optics, 2000, 39(1): 40–53

[22]

Lu C, Lipson R. Interference lithography: A powerful tool for fabricating periodic structures. Laser & Photonics Reviews, 2010, 4(4): 568–580

[23]

Brueck S. Optical and interferometric lithography-Nanotechnology enablers. Proceedings of the IEEE, 2005, 93(10): 1704–1721

[24]

Ouk Kim S, Solak H H, Stoykovich M P, . Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates. Nature, 2003, 424(6947): 411–414

[25]

Garcia R, Knoll A W, Riedo E. Advanced scanning probe lithography. Nature Nanotechnology, 2014, 9(8): 577–587

[26]

Bates C M, Maher M J, Janes D W, . Block copolymer lithography. Macromolecules, 2014, 47(1): 2–12

[27]

Hawker C J, Russell T P. Block copolymer lithography: Merging “bottom-up” with “top-down” processes. MRS Bulletin, 2005, 30(12): 952–966

[28]

Kim H C, Park S M, Hinsberg W D. Block copolymer based nanostructures: Materials, processes, and applications to electronics. Chemical Reviews, 2010, 110(1): 146–177

[29]

Wan L, Ruiz R, Gao H, . The limits of lamellae-forming PS-b-PMMA block copolymers for lithography. ACS Nano, 2015, 9(7): 7506–7514

[30]

Bae S, Kim H, Lee Y, . Roll-to-roll production of 30-inch graphene films for transparent electrodes. Nature Nanotechnology, 2010, 5(8): 574–578

[31]

Kooy N, Mohamed K, Pin L T, . A review of roll-to-roll nanoimprint lithography. Nanoscale Research Letters, 2014, 9(1): 320

[32]

Yoshikawa H, Taniguchi J, Tazaki G, . Fabrication of high-aspect-ratio pattern via high throughput roll-to-roll ultraviolet nanoimprint lithography. Microelectronic Engineering, 2013, 112: 273–277

[33]

Ahn S H, Guo L J. High‐speed roll‐to‐roll nanoimprint lithography on flexible plastic substrates. Advanced Materials, 2008, 20(11): 2044–2049

[34]

Ahn S H, Guo L J. Large-area roll-to-roll and roll-to-plate nanoimprint lithography: A step toward high-throughput application of continuous nanoimprinting. ACS Nano, 2009, 3(8): 2304–2310

[35]

Ok J G, Seok Youn H, Kyu Kwak M, . Continuous and scalable fabrication of flexible metamaterial films via roll-to-roll nanoimprint process for broadband plasmonic infrared filters. Applied Physics Letters, 2012, 101(22): 223102

[36]

Ruiz R, Kang H, Detcheverry F A, . Density multiplication and improved lithography by directed block copolymer assembly. Science, 2008, 321(5891): 936–939

[37]

Seltmann R, Doleschal W, Gehner A, . New system for fast submicron optical direct writing. Microelectronic Engineering, 1996, 30(1–4): 123–127

[38]

Zhang A P, Qu X, Soman P, . Rapid fabrication of complex 3D extracellular microenvironments by dynamic optical projection stereolithography. Advanced Materials, 2012, 24(31): 4266–4270

[39]

Scholder O, Jefimovs K, Shorubalko I, . Helium focused ion beam fabricated plasmonic antennas with sub-5 nm gaps. Nanotechnology, 2013, 24(39): 395301

[40]

Tseng A A. Recent developments in nanofabrication using focused ion beams. Small, 2005, 1(10): 924–939

[41]

Utke I, Moshkalev S, Russell P. Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications. New York: Oxford University Press, 2012

[42]

Watt F, Bettiol A, Van Kan J, . Ion beam lithography and nanofabrication: A review. International Journal of Nanoscience, 2005, 04(03): 269–286

[43]

Piqué A, Chrisey D, Auyeung R, . A novel laser transfer process for direct writing of electronic and sensor materials. Applied Physics. A: Materials Science & Processing, 1999, 69(7): S279–S284

[44]

Shir D, Liao H, Jeon S, . Three-dimensional nanostructures formed by single step, two-photon exposures through elastomeric Penrose quasicrystal phase masks. Nano Letters, 2008, 8(8): 2236–2244

[45]

Singer J P, Lee J H, Kooi S E, . Rapid fabrication of 3D terahertz split ring resonator arrays by novel single-shot direct write focused proximity field nanopatterning. Optics Express, 2012, 20(10): 11097–11108

[46]

Bloomstein T, Marchant M F, Deneault S, . 22-nm immersion interference lithography. Optics Express, 2006, 14(14): 6434–6443

[47]

Quiñónez F, Menezes J, Cescato L, . Band gap of hexagonal 2D photonic crystals with elliptical holes recorded by interference lithography. Optics Express, 2006, 14(11): 4873–4879

[48]

Escuti M J, Crawford G P. Holographic photonic crystals. Optical Engineering, 2004, 43(9): 1973–1987

[49]

Lu Y T, Chi S. Compact, reliable asymmetric optical configuration for cost-effective fabrication of multiplex dot matrix hologram in anti-counterfeiting applications. Optik-International Journal for Light and Electron Optics, 2003, 114(4): 161–167

[50]

Wan W, Huang W, Pu D, . High performance organic distributed Bragg reflector lasers fabricated by dot matrix holography. Optics Express, 2015, 23(25): 31926–31935

[51]

Tseng A A, Notargiacomo A, Chen T P. Nanofabrication by scanning probe microscope lithography: A review. Journal of Vacuum Science & Technology B, 2005, 23(3): 877

[52]

Cheong L L, Paul P, Holzner F, . Thermal probe maskless lithography for 27.5 nm half-pitch Si technology. Nano Letters, 2013, 13(9): 4485–4491

[53]

Kim B H, Kim J Y, Kim S O. Directed self-assembly of block copolymers for universal nanopatterning. Soft Matter, 2013, 9(10): 2780–2786

[54]

Gu W, Xu J, Kim J K, . Solvent-assisted directed self-assembly of spherical microdomain block copolymers to high areal density arrays. Advanced Materials, 2013, 25(27): 3677–3682

[55]

Sivaniah E, Matsubara S, Zhao Y, . Symmetric diblock copolymer thin films on rough substrates: Microdomain periodicity in pure and blended films. Macromolecules, 2008, 41(7): 2584–2592

[56]

Jeong S J, Moon H S, Kim B H, . Ultralarge-area block copolymer lithography enabled by disposable photoresist prepatterning. ACS Nano, 2010, 4(9): 5181–5186

[57]

Jeong S J, Kim J E, Moon H S, . Soft graphoepitaxy of block copolymer assembly with disposable photoresist confinement. Nano Letters, 2009, 9(6): 2300–2305

[58]

Sun Z, Chen Z, Zhang W, . Directed self-assembly of poly (2-vinylpyridine)-b-polystyrene-b-poly (2-vinylpyridine) triblock copolymer with sub-15 nm spacing line patterns using a nanoimprinted photoresist template. Advanced Materials, 2015, 27(29): 4364–4370

[59]

Cushen J, Wan L, Blachut G, . Double-patterned sidewall directed self-assembly and pattern transfer of sub-10 nm PTMSS-b-PMOST. ACS Applied Materials & Interfaces, 2015, 7(24): 13476–13483

[60]

Chou S Y, Krauss P R, Renstrom P J. Imprint of sub‐25 nm vias and trenches in polymers. Applied Physics Letters, 1995, 67(21): 3114–3116

[61]

Chou S Y, Krauss P R, Renstrom P J. Imprint lithography with 25-nanometer resolution. Science, 1996, 272(5258): 85–87

[62]

Chou S Y, Krauss P R, Zhang W, . Sub-10 nm imprint lithography and applications. Journal of Vacuum Science & Technology B, 1997, 15(6): 2897–2904

[63]

Lan H, Ding Y, Liu H, . Mold deformation in soft UV-nanoimprint lithography. Science in China Series E: Technological Sciences, 2009, 52(2): 294–302

[64]

Ruchhoeft P, Colburn M, Choi B, . Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography. Journal of Vacuum Science & Technology B, 1999, 17(6): 2965–2969

[65]

Resnick D, Dauksher W, Mancini D, . Imprint lithography for integrated circuit fabrication. Journal of Vacuum Science & Technology B, 2003, 21(6): 2624–2631

[66]

Dauksher W, Nordquist K, Mancini D, . Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates. Journal of Vacuum Science & Technology B, 2002, 20(6): 2857–2861

[67]

Kim H J, Almanza‐Workman M, Garcia B, . Roll‐to‐roll manufacturing of electronics on flexible substrates using self‐aligned imprint lithography (SAIL). Journal of the Society for Information Display, 2009, 17(11): 963–970

[68]

Sreenivasan S, McMackin I, Xu F, . Using reverse-tone bilayer etch in ultraviolet nanoimprint lithography. MICRO, 2005, 23(1): 37–44

[69]

Liang X, Zhang W, Li M, . Electrostatic force-assisted nanoimprint lithography (EFAN). Nano Letters, 2005, 5(3): 527–530

[70]

Hirai Y, Konishi T, Yoshikawa T, . Simulation and experimental study of polymer deformation in nanoimprint lithography. Journal of Vacuum Science & Technology B, 2004, 22(6): 3288–3293

[71]

Li X, Shao J, Tian H, . Fabrication of high-aspect-ratio microstructures using dielectrophoresis-electrocapillary forcedriven UV-imprinting. Journal of Micromechanics and Microengineering, 2011, 21(6): 065010

[72]

Li X, Tian H, Wang C, . Electrowetting assisted air detrapping in transfer micromolding for difficult-to-mold microstructures. ACS Applied Materials & Interfaces, 2014, 6(15): 12737–12743

[73]

Tian H, Shao J, Ding Y, . Electrohydrodynamic micro-/nanostructuring processes based on prepatterned polymer and prepatterned template. Macromolecules, 2014, 47(4): 1433–1438

RIGHTS & PERMISSIONS

Higher Education Press and Springer-Verlag Berlin Heidelberg

AI Summary AI Mindmap
PDF (477KB)

2781

Accesses

0

Citation

Detail

Sections
Recommended

AI思维导图

/