Until now, the mainstream and effective methods for preparing CuSbS
2 films and devices are the vacuum and solution methods. Vacuum methods were employed to produce the CuSbS
2 film some time back. In 2008, Rabhi et al. fabricated CuSbS
2 film via a single-source vacuum thermal evaporation method [
22]. The CuSbS
2 powder evaporated and deposited on unheated glass in vacuum, and the film was then annealed at 200°C for 2 h. Without the high-temperature heat treatment, the film exhibited an amorphous structure during characterization analysis. The CuSbS
2 film became polycrystalline only after annealing at temperatures of greater than 200°C. Although the fabrication is complex, this vacuum evaporation method achieved large-scale and uniform fabrication. In 2011, Garza et al. proposed a new evaporation method [
23], in which the Cu film was deposited onto the Sb
2S
3 film formed by chemical bath deposition (CBD) on glass. After the Cu film was deposited by thermal evaporation, the Sb
2S
3/Cu layer was annealed at 300°C–380°C. The XRD result showed that the Sb
2S
3/Cu layer would transform to the pure orthorhombic CuSbS
2 film during the high-temperature annealing process. Meanwhile, the Hall effect measurements were performed to confirm the p-type conductivity of CuSbS
2. Wan et al. subsequently proposed a two-stage co-evaporation process to obtain the film and construct an efficient device [
24]. In this process, an Sb-rich precursor was deposited by co-evaporating Cu, Sb, and S at a low substrate temperature (230°C). Sb and S were then co-evaporated at a higher temperature (370°C) to obtain the film. This process improves the crystallinity and phase purity of the CuSbS
2 film. When constructed into a solar cell device having a structure of Mo/CuSbS
2/CdS/ZnO/ZnO:Al/Ag, the film achieved an encouraging PCE of 1.9% with a high open-circuit voltage (
VOC) of 526 mV. The co-sputtering processes for CuSbS
2 were recently explored by Saragih et al. [
25]. They obtained a CuSbS
2 film layer on the TiN-coated Mo/glass substrate by the co-sputtering technique at 300°C, with a Cu and Sb
2S
3 cermet target at 50–60 W and a Cu metal target at 2 W, and annealing was subsequently performed at 350°C–450°C for 1 h. Based on the application of GaN and In
0.15Ga
0.85N as n-type bilayers, a solar cell device was constructed, achieving a PCE of 2.99%. Welch et al. successfully fabricated a CuSbS
2 film after magnetron co-sputtering of the Cu
2S and Sb
2S
3 targets [
26].