Near-infrared carbon-implanted waveguides in Tb3+-doped aluminum borosilicate glasses

Yue WANG , Jiaxin ZHAO , Qifeng ZHU , Jianping SHEN , Zhongyue WANG , Haitao GUO , Chunxiao LIU

Front. Optoelectron. ›› 2019, Vol. 12 ›› Issue (4) : 392 -396.

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Front. Optoelectron. ›› 2019, Vol. 12 ›› Issue (4) : 392 -396. DOI: 10.1007/s12200-019-0869-6
RESEARCH ARTICLE
RESEARCH ARTICLE

Near-infrared carbon-implanted waveguides in Tb3+-doped aluminum borosilicate glasses

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Abstract

Ion implantation has played a unique role in the fabrication of optical waveguide devices. Tb3+-doped aluminum borosilicate (TDAB) glass has been considered as an important magneto-optical material. In this work, near-infrared waveguides have been manufactured by the (5.5+ 6.0) MeV C3+ ion implantation with doses of (4.0+ 8.0) × 1013 ions·cm2 in the TDAB glass. The modes propagated in the TDAB glass waveguide were recorded by a prism-coupling system. The finite-difference beam propagation method (FD-BPM) was carried out to simulate the guiding characteristics of the TDAB glass waveguide. The TDAB glass waveguide allows the light propagation with a single-mode at 1.539 mm and can serve as a potential candidate for future waveguide isolators.

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Tb 3+-doped aluminum borosilicate (TDAB) glass / optical waveguide / ion implantation

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Yue WANG, Jiaxin ZHAO, Qifeng ZHU, Jianping SHEN, Zhongyue WANG, Haitao GUO, Chunxiao LIU. Near-infrared carbon-implanted waveguides in Tb3+-doped aluminum borosilicate glasses. Front. Optoelectron., 2019, 12(4): 392-396 DOI:10.1007/s12200-019-0869-6

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