Near-infrared carbon-implanted waveguides in Tb³⁺-doped aluminum borosilicate glasses

Abstract

Ion implantation has played a unique role in the fabrication of optical waveguide devices. Tb³⁺-doped aluminum borosilicate (TDAB) glass has been considered as an important magneto-optical material. In this work, near-infrared waveguides have been manufactured by the (5.5+ 6.0) MeV C³⁺ ion implantation with doses of (4.0+ 8.0) × 10¹³ ions·cm⁻² in the TDAB glass. The modes propagated in the TDAB glass waveguide were recorded by a prism-coupling system. The finite-difference beam propagation method (FD-BPM) was carried out to simulate the guiding characteristics of the TDAB glass waveguide. The TDAB glass waveguide allows the light propagation with a single-mode at 1.539 mm and can serve as a potential candidate for future waveguide isolators.

Keywords

Tb³⁺-doped aluminum borosilicate (TDAB) glass / optical waveguide / ion implantation

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Acknowledgements

This work was financially supported by the National Natural Science Foundation of China (Grant Nos. 11405041, 51502144 and 61475189).

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