Edge effect of optical surfacing process with different data extension algorithms

Yang LIU, Haobo CHENG, Zhichao DONG, Hon-Yuen TAM

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PDF(572 KB)
Front. Optoelectron. ›› 2014, Vol. 7 ›› Issue (1) : 77-83. DOI: 10.1007/s12200-014-0393-7
RESEARCH ARTICLE

Edge effect of optical surfacing process with different data extension algorithms

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Abstract

This study presents a strategy which integrates extra polishing path (EPP) and error map extension to weaken the edge effect in the ultraprecise optical surfacing process. Different data extension algorithms were presented and analyzed. The neighbor-hood average can be selected as the frequently-used method, as it has not bad precision and time-saving performance for most surface forms through the simulation results and practical experiment. The final error map was obtained, its peak-to-valley (PV) was 0.273λ and root mean square (RMS) was 0.028λ (λ = 632.8 nm). The edge effect was weakened and suppressed well through the experiment.

Keywords

edge effect / convergence rate / extension algorithms

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Yang LIU, Haobo CHENG, Zhichao DONG, Hon-Yuen TAM. Edge effect of optical surfacing process with different data extension algorithms. Front Optoelec, 2014, 7(1): 77‒83 https://doi.org/10.1007/s12200-014-0393-7

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Acknowledgements

This work was supported by the National Natural Science Foundation of China (Grant Nos. 61308075, 61128012, 61061160503 and 61222506), Specialized Research Fund for the Doctoral Program of Higher Education (No. 20131101110026), and China Postdoctoral Science Foundation funded project (Nos. 2013M540052).

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2014 Higher Education Press and Springer-Verlag Berlin Heidelberg
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