Development and prospect of near-field optical measurements and characterizations

Jia WANG , Qingyan WANG , Mingqian ZHANG

Front. Optoelectron. ›› 2012, Vol. 5 ›› Issue (2) : 171 -181.

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Front. Optoelectron. ›› 2012, Vol. 5 ›› Issue (2) : 171 -181. DOI: 10.1007/s12200-012-0257-y
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Development and prospect of near-field optical measurements and characterizations

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Abstract

Scanning near-field optical microscopy (SNOM) is an ideal experimental measuring system in nano-optical measurements and characterizations. Besides microscopy with resolution beyond the diffraction limit, spectroscope with nanometer resolution and other instruments with novel performances have been indispensable for researches in nano-optics and nanophotonics. This paper reviews the developing history of near-field optical (NFO) measuring method and foresees its prospects in future. The development of NFO measurements has gone through four stages, including optical imaging with super resolution, near-field spectroscopy, measurements of nano-optical parameters, and detections of near-field interactions. For every stage, research objectives, technological properties and application fields are discussed.

Keywords

scanning near-field optical microscopy (SNOM) / near-field optical (NFO) measurement / super-resolution imaging / near-field spectroscopy / nano-optics / nanophotonics

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Jia WANG, Qingyan WANG, Mingqian ZHANG. Development and prospect of near-field optical measurements and characterizations. Front. Optoelectron., 2012, 5(2): 171-181 DOI:10.1007/s12200-012-0257-y

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