Measurement of optical mirror with a small-aperture interferometer

Ya GAO; Hon Yuen TAM; Yongfu WEN; Huijing ZHANG; Haobo CHENG

doi:10.1007/s12200-012-0233-6

Front. Optoelectron. ›› 2012, Vol. 5 ›› Issue (2) : 218 -223. DOI: 10.1007/s12200-012-0233-6

RESEARCH ARTICLE

Measurement of optical mirror with a small-aperture interferometer

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Abstract

In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are $0.0038 λ$ and $0.0004 λ$ , respectively. It proved that the model and method are helpful for large optical measurement.

Keywords

subaperture stitching / interferometry / residual error

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Ya GAO,Hon Yuen TAM,Yongfu WEN,Huijing ZHANG,Haobo CHENG. Measurement of optical mirror with a small-aperture interferometer. Front. Optoelectron., 2012, 5(2): 218-223 DOI:10.1007/s12200-012-0233-6