Analysis of TiO2 for microelectronic applications: effect of deposition methods on their electrical properties

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Front. Optoelectron. ›› 2011, Vol. 4 ›› Issue (4) : 349-358. DOI: 10.1007/s12200-011-0188-z
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Analysis of TiO2 for microelectronic applications: effect of deposition methods on their electrical properties

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{{article.zuoZheEn_L}}. {{article.titleEn}}. Front Optoelec Chin, 2011, 4(4): 349‒358 https://doi.org/10.1007/s12200-011-0188-z

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