Design of photosensitive microstructured polymer optical fibers

Abstract

We propose a new hole-assisted polymer optical fiber design to eliminate the influence of dopant diffusion and to increase the ultra violet (UV) writing efficiency in fiber Bragg grating inscription. The optical waveguide is formed inside a solid core polymethyl methacrylate (PMMA) doped with photosensitive trans-4-stilbenemethanol, surrounded by a ring of three large air holes with double cladding. We determined a map of the single-mode and multi-mode phase transitions using a finite-element-based vectorial optical mode solver. A wide range of geometrical configurations for the single-transverse-mode (HE11) propagation in the visible was obtained. The design is optimized to operate at the low optical loss wavelengths of 580 and 770nm.