High-purity H2O2 is widely used as an environmentally friendly wet electronic chemical for the production of printed circuit boards, semiconductors and integrated circuits. In this work, the authors prepared primary, secondary and tertiary amino-functionalized zirconia by the postgrafting method, and systematically studied the simultaneous adsorption process of metallic ions (M+, exist typically Al3+, Fe3+, Mg2+, Ca2+, K+, Na+), phosphate and total oxidizable carbon (TOC) from a real H2O2 solution and the adsorption mechanism of M+. The importance of the work is from: 1) Figuring out the relationship between the type of amino groups and adsorption performance of impurities from the 30% H2O2 solution. 2) Finding the promoting effect of coexisted phosphate on adsorption of M+. 3) Revealing the adsorption mechanism of M+ by DFT calculations, combining the experiments of adsorption isotherms and kinetics. 4) Achieving the highly effective adsorption removal of multiple impurities, low leaching of Zr4+ and decomposition of H2O2. (Yu Meng, Yitong Wang, Guozhu Li, Guozhu Liu, Li Wang, Front. Chem. Sci. Eng. 2024, 18(5): 56)
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