Shape control and removal footprint characteristics of a novel wheel bonnet polishing tool

Abstract

This paper presents a novel wheel bonnet polishing (WBP) process, combining the flexible contact characteristics of bonnet polishing with the high-efficiency material removal capabilities of wheel polishing. A comprehensive tool preparation scheme is developed, including a surface approximation-based method for polishing pad design and a precision dressing technique, ensuring good adhesion to the bonnet base and high rotational accuracy. Finite element simulations and experimental validation reveal the effects of internal pressure and clamping distance on bonnet deformation and contact regulation. The material removal characteristics of the wheel bonnet under various process parameters are systematically studied, confirming its capability to generate a stable, symmetric elliptical Gaussian removal profile. Continuous area polishing experiments show that scratches potentially appear when the tool feed direction aligns with the tangential speed of the bonnet. However, adjusting the polishing posture and path spacing can substantially reduce scratches. The roughness evolution of the polished area shows a rapid decrease, eventually stabilizing. Finally, the technique is applied to large-area smooth polishing of high-precision air floating guide rails. Experimental results show that surface roughness (Sa) rapidly decreases from an average 1.5 μm to a uniform 10 nm, revealing a converging form accuracy (PV) to 0.8 μm and an RMS value reaching 179.73 nm. Overall, the WBP process shows remarkable potential for high-quality surface processing, highlighting its value in advanced manufacturing.

Graphical abstract

Keywords

surface roughness / polishing / bonnet polishing / wheel bonnet / removal footprint

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Higher Education Press