Van der Waals epitaxy of type-II band alignment CsPbI3/TMDC heterostructure for optoelectronic applications

Chang Lu , Shunhui Zhang , Meili Chen , Haitao Chen , Mengjian Zhu , Zhengwei Zhang , Jun He , Lin Zhang , Xiaoming Yuan

Front. Phys. ›› 2024, Vol. 19 ›› Issue (5) : 53206

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Front. Phys. ›› 2024, Vol. 19 ›› Issue (5) : 53206 DOI: 10.1007/s11467-024-1404-9
RESEARCH ARTICLE

Van der Waals epitaxy of type-II band alignment CsPbI3/TMDC heterostructure for optoelectronic applications

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Abstract

Van der Waals epitaxy allows heterostructure formation without considering the lattice match requirement, thus is a promising method to form 2D/2D and 2D/3D heterojunction. Considering the unique optical properties of CsPbI3 and transition metal dichalcogenides (TMDCs), their heterostructure present potential applications in both photonics and optoelectronics fields. Here, we demonstrate selective growth of cubic phase CsPbI3 nanofilm with thickness as thin as 4.0 nm and Zigzag/armchair orientated nanowires (NWs) on monolayer WSe2. Furthermore, we show growth of CsPbI3 on both transferred WSe2 on copper grid and WSe2 based optoelectrical devices, providing a platform for structure analysis and device performance modification. Transmission electron microscopy (TEM) results reveal the epitaxial nature of cubic CsPbI3 phase. The revealed growth fundamental of CsPbI3 is universal valid for other two-dimensional substrates, offering a great advantage to fabricate CsPbI3 based van der Waals heterostructures (vdWHs). X-ray photoelectron spectroscopy (XPS) and optical characterization confirm the type-II band alignment, resulting in a fast charger transfer process and the occurrence of a broad emission peak with lower energy. The formation of WSe2/CsPbI3 heterostructure largely enhance the photocurrent from 2.38 nA to 38.59 nA. These findings are vital for bottom-up epitaxy of inorganic semiconductor on atomic thin 2D substrates for optoelectronic applications.

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Keywords

van der Waals epitaxy / band alignment / growth fundamental / charge transfer / photodetector

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Chang Lu, Shunhui Zhang, Meili Chen, Haitao Chen, Mengjian Zhu, Zhengwei Zhang, Jun He, Lin Zhang, Xiaoming Yuan. Van der Waals epitaxy of type-II band alignment CsPbI3/TMDC heterostructure for optoelectronic applications. Front. Phys., 2024, 19(5): 53206 DOI:10.1007/s11467-024-1404-9

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1 Introduction

Thanks to the discovery of two-dimensional materials with fruitful unique properties, such as boron nitride (h-BN), TMDCs and graphene, it unlocked new opportunities for next generation of electronic and optoelectronic devices such as photodetectors [1,2], transistors [3,4], light emitting diodes [5], lasers [6-8], and photovoltaic devices [9,10]. Van der Waals heterostructures (vdWHs) allow easy tuning of the optical and electrical properties that are desired for specific applications. First, the formation of vdWH is a promising strategy to overcome the drawback of weak light absorption in monolayer TMDCs. Tsang et al. [11] designed a PtSe2/CdTe heterostructure, the increased light absorption together with charge transfer improved the responsivity and on/off current ratio to 506.5 mA/W and 7 × 106. Secondly, vertical TMDC heterostructures with twist angle create an interfacial charge transfer pathway and allow formation of interlayer excitons with longer lifetime, thus attracting extensive attentions [12]. Thirdly, vdWH is able to enhance the Förster-type energy transfer efficiency. Kozawa et al. [13] exhibited efficient and ultrafast (~1 ps) fluorescence resonance energy transfer (FRET) in a closely coupled WS2/MoSe2 heterojunction, which can be applied for energy harvesting. For the purpose to improve the light absorption, inorganic metal-halide perovskite is an ideal candidate showing high light absorption coefficients, high optoelectronic conversion efficiency, thus have been widely used for low-cost and efficient photonic, photovoltaic and optoelectronic devices [14]. Benefiting from these distinct advantages, inorganic metal-halide perovskites are utilized in the formation of heterojunctions with TMDCs, resulting in a profound alteration of their optical properties as well as enhancements in device performance, such as photoelectric detection [15,16] and light-harvesting [17].

Currently, top-down transferring is widely used to prepare inorganic metal-halide perovskite/TMDCs heterojunctions thanks to its advantages in rapid fabrication of different heterojunctions, such as quantum dots(QDs) [18] and NWs [19] on TMDCs. This method is suitable to study the optical and electronic properties of the heterostructure as well as prototype device fabrication [2022]. By utilizing a hybrid structure consisting of metal-halide perovskites and TMDCs, it becomes possible to activate distinct nonradiative exciton relaxation (NRER) channels at the interface. Jiang et al. [18] demonstrated that CsPbBr3 QDs/monolayer WS2 forms a type-I band alignment, showing efficient and charge transferring process which can boost the photodetection efficiency. Moreover, MoS2/CsPbBr3 heterostructure based device shows efficient charge separation at the heterojunction interface and thus enhanced photoelectric conversion efficiency [23]. Despite the great achievement of top-down transferring approach, their applications are limited by lack of capability in scalable production. On the contrary, van der Waals epitaxy is another method of fabricating 2D material based heterostructure. Differing from traditional epitaxy, this method relies on weak van der Waals force between the 2D substrate and the epitaxial 2D or 3D layer, thus it does not need to satisfy lattice-match requirement during traditional epitaxy method [24]. Moreover, employing van der Waals epitaxy permits adjustment of crystal structure, composition and thickness of the heterostructure, further refining its photoelectric performance. Consequently, These advantages make it highly suitable for heterojunction integration, thus gathering significant attentions [2532], such as III‒V semiconductor on graphene/mica [24,33], perovskite NWs/nanoplate on mica [34], ZnO [35], and Ga2O3 on mica [36]. During these studies, graphene and mica are mostly applied thanks to their easy availability as well as good heat tolerance. TMDCs are also applied for van der Waals epitaxy of free standing InxGa1−xAs NWs [37]. This method can enable large-scale, patterned high-quality 2D material/inorganic semiconductor heterojunction formation, rendering the van der Waals heterojunction field particularly attractive. Indeed, wafer scale high quality GaAs and GaN related heterostructure have been applied to grown on graphene (h-BN) and applied for flexible as well as vertical full-color micro-LED applications [33,38]. Despite of these advantages, the development of van der Waals epitaxy still needs more research. Firstly, more growth fundamental should be revealed to understand its growth mechanism. Secondly, previous results mainly focus on the van der Waals epitaxy itself instead of the properties of the formed heterostructure. Thirdly, even though van der Waals epitaxy of metal-halide perovskite on mica has been reported [39], no attempts on van der Waals epitaxy of CsPbX3 on TMDCs have been reported.

Considering the importance of van der Waals epitaxy in heterostructure formation and potential application in the photonic and electronic fields between TMDCs and inorganic perovskite semiconductor, we aim to bridge the gap by demonstrating the growth of CsPbI3 on TMDCs layers via the chemical vapor deposition (CVD) method. We show that CsPbI3 can selectively grow on WSe2 within a wide range of growth parameters with morphology of either nanofilm or NWs. The appropriate growth temperature and precursor concentration are critical parameters for controlling the growth mode of CsPbI3, deepening the van der Waals growth fundamental of CsPbI3. By tuning the growth parameters, nanofilms with adjustable thicknesses from 4.0 to 11.6 nm and NWs with Zigzag and armchair orientations can be formed, and both of which exhibit epitaxial relationships with the growth substrate. Meantime, the crystal growth prefers to form a cubic phase on WSe2 substrate and does not damage the underlying fragile monolayer WSe2. Additionally, high resolution XPS analysis confirms the formation of the CsPbI3/WSe2 heterojunction, which exhibits a type-II band alignment characterized by a valence band offset (VBO) of 0.46 ± 0.10 eV and a conduction band offset (CBO) of 0.34 ± 0.10 eV. Optical characterizations reveal that CsPbI3 and monolayer WSe2, MoS2, WS2, and MoSe2 form a type-II band alignment, which exhibits efficient and ultrafast charge transport. This hybrid heterostructure induces a lower energy emission peak at the shoulder of pure TMDC emission peak at low temperature. Furthermore, the revealed growth mechanism is also applicable to other two-dimensional materials, including but not limited to MoSe2, MoS2, WS2, and h-BN. Furthermore, we successfully grow CsPbI3 film directly on monolayer WSe2 based photodetector devices. The growth of CsPbI3 notably enhance the photocurrent from 2.38 to 38.59 nA and the on/off ratio from 3.14 to 16.37. Therefore, our growth findings pave the way for integrating inorganic metal-halide perovskites and 2D materials in a controllable and scalable manner through bottom-up approach.

2 Experimental methods

2.1 CsPbI3/TMDCs heterostructure formation

First, monolayer TMDC was grown on Si/SiO2 substrate via physical vapor deposition (PVD) method in a single-zone tube furnace (Jiusuo Technology) equipped with 1-inch diameter quartz tube [40]. Then, heterostructure formation is realized by growing CsPbI3 in a dual-zone tube furnace with 1-inch diameter quartz tubes. A mixture of cesium iodide powder (40 μmol, 99%, Sigma-Aldrich) and lead iodide powder (40 μmol, 98%, Sigma-Aldrich) was used as precursor for CsPbI3 growth and placed in the heating zone of the furnace. Before heating, the furnace was pumped to base pressure about 0.01 mbar and then a mixed Ar/H2 with ratio of 19:1 was used as the carrier gas at a flow rate of 200 sccm until the pressure was stabilized at 400-500 mbar. The as-grown TMDC layer on SiO2/Si substrate was put approximately 4 inches downstream from the precursor. The pressure of the furnace during the growth was controlled by a mechanical pump and measured by vacuum gauge. During the growth, the temperatures of the precursor was set at 660 °C while the growth temperature of the substrate was changed from 170−330 °C. The CVD reaction was carried out for 5 minutes followed by natural cooling down of the furnace. The standard growth temperature, precursor weight and pressure are 230 °C, 80 μmol precursor mixture and 400 mbar, respectively, since it leads to uniform CsPbI3 film growth.

2.2 Device fabrication and measurement

The obtained WSe2 films were transferred onto Si/SiO2 substrates with PDMS thin films. The Au electrodes were fabricated on WSe2 by photolithography and electron-beam evaporation, leading to a channel width of 2‒10 μm and an electrode width of 3 μm. Subsequently, the fabricated WSe2 device was loaded into the furnace for CsPbI3 film growth. The electronic measurements were carried out in a probe station, and data were recorded with a semiconductor device analyzer (Agilent-B1500A).

2.3 Optical characterizations

The morphology of CsPbI3/TMDCs heterostructures were characterized using optical microscopy, scanning electron microscopy (SEM, Tescan Mira4) and atom force microscopy (AFM, Agilent 5500 AFM/SPM). HRTEM images were recorded using a JEM-F200 microscope operated at an accelerating voltage of 80 kV to avoid damage to the CsPbI3. For HRTEM characterization studies, WSe2 was first transferred to a copper grid by a typical KOH-assisted wet-transfer method [41]. Then, CsPbI3 was grown on the transferred WSe2 before TEM analysis. XPS analyses (Thermo Scientific K-Alpha) were used to evaluate the chemical compositions and valence states of the as-grown samples. All Raman and photoluminescence (PL) measurements at room temperature were performed using a Renishaw in Via Reflex system where a 532 nm laser was focused onto the sample through a ×50 objective lens, resulting in a spot diameter of smaller than 1 μm. For temperature dependent PL measurements, LINKAM’s cryogenic controller and probe stand was connected to the PL system and the laser spot was focused on the sample through a long working distance ×50 objective lens. Time-resolved photoluminescence (TRPL) were measured in a home-built micro-PL system where 532 nm pulsed laser was focused on the sample via a ×100 objective lens and the decay signal was detected by a single photon detector connected to a Picoharp 300 system [42].

3 Results and discussion

Fig.1 shows the successful growth of CsPbI3 nanofilm and NWs on monolayer WSe2. Growth temperature plays an important role in determining the morphology of CsPbI3. At low temperature, such as 230 °C, CsPbI3 nanofilms grow selectively on WSe2 monolayer while no growth is observed on the SiO2 surface. Increasing temperature to 260 °C leads to the formation of a high density of CsPbI3 NWs. Further increasing the temperature to 330 °C, the surface adatom concentration of CsI and PbI2 on WSe2 becomes lower than that required to overcome the nucleation barrier, thus no CsPbI3 crystal could be observed. However, due to the presence of dangling bonds, there is a lower nucleation barrier at the edge of WSe2, allowing for nucleation and formation of CsPbI3 triangular rings [see Fig.1(c)]. Further increasing the temperature results in no CsPbI3 nucleation on the whole substrate. It is worth mentioning that during the whole investigated temperature range from 170 °C to 330 °C [see Fig. S1 in the Supporting Information (SI)], CsPbI3 prefers to selectively grow on the WSe2 instead of the amorphous SiO2 substrate.

Precursor concentration is another important parameter determines the growth of CsPbI3. At standard film growth conditions, either lower or double the precursor weight does not change the morphology of as-grown CsPbI3 except for the film thickness. Indeed, AFM measurements in Fig.1(h) demonstrate that the film thickness can be tuned from around 5 nm to ~12 nm by changing the precursor weight. Energy Dispersive X-Ray Spectroscopy (EDX) mapping shows the uniform distribution of Pb element on the WSe2 flake, again confirming the formation of CsPbI3 film. It is worth mentioning that, the CsPbI3 thickness can be manipulated by changing the growth time as well (see Fig. S2 in the SI). From both inset SEM images in Fig.1(a)‒(c) and AFM images, there exist CsPbI3 islands on the WSe2, indicating that the as-grown CsPbI3 film is formed by multi nucleation and growth process. Despite of the island formation, our method can selectively grow CsPbI3 on WSe2 with tunable thickness at nanometer scale, which is important to study the optical performance of the heterostructure. Surprisingly, further elevating the precursor weight ratio to threefold leads to NW formation against thick film. These formed NWs under two different growth conditions are slightly different. In general, CsPbI3 NWs prefer to grow along either Zigzag or armchair direction of the WSe2, as illustrated in Fig.1(i). At high growth temperature, nearly all the NWs grow along the Zigzag direction with a height of around 47 nm. In comparison, the aligned direction of NWs grown at lower temperature but higher precursor weight is different. Statistically, around 68% (32%) of NWs grow along the armchair (Zigzag) direction. The NW height is measured to be around 48.3 nm. In addition to growth temperature and precursor weight, the growth pressure affects the CsPbI3 growth trend as well (see Fig. S3 in the SI). Maintaining a suitable pressure is a key for successful CsPbI3 film growth.

The observed growth evolution of CsPbI3 is explained in Fig.2. Supersaturation of CsPbI3, which is determined by the growth temperature and the localized concentration on the WSe2, plays a crucial role in determining the nucleation process. The growth behavior of CsPbI3 is related to the adsorption, diffusion and desorption of CsI and PbI2 adatoms on the WSe2. These three processes compete with each other. According to the literature [43], the low adsorption energy of CsI on TMD leads to a higher precursor concentration on the TMD than the SiO2 substrate, thus resulting selective growth of CsPbI3 on WSe2. At low temperatures, the desorption rate of adatoms on the surface of WSe2 is low. Consequently, the high precursor concentration on the surface exceeds what is required to overcome the nucleation barrier and leads to a high nucleation density on the whole WSe2 flake. During growth, these nuclei continue to grow and expand, forming large polycrystal nanofilms on WSe2. According to the well-known van der Waals growth mechanism, heterostructure with the smallest lattice match is easy to form, since the interface strain caused by lattice mismatch can be effectively reduced [44], thereby minimizing the interfacial energy. During the growth, when lattice mismatch along one certain direction is small but quite large when perpendicular to this direction, crystal thus prefers to grow along one direction to minimize the interfacial energy, thus leading to the formation of NWs [45]. Normally high precursor diffusion rate allows growth of crystal with the smallest lattice mismatch [46]. According to the calculations, lattice mismatch between CsPbI3 and WSe2 is quite small along Zigzag and armchair directions, which is 0.2% and 0.5% respectively, as shown in Fig. S4. In comparison, lattice mismatch perpendicular to Zigzag (2.3%) and armchair direction (1.3%) is quite large. At high temperatures, the elevated temperature can increase the diffusion rate of precursor and reduce the adatom concentration on the WSe2, explaining the reduced nucleation density. Consequently, crystal prefers to grow with minimum lattice mismatch or interfacial energy. Based on our calculation, CsPbI3 along Zigzag direction shows the smallest lattice match, therefore NWs are formed along Zigzag direction. At high precursor weight, it is surprising to see the formation of NWs but this trend has been double checked. It is probably that the adatom diffusion rate and desorption rate of CsPbI3 precursor on the WSe2 surface is chemical potential dependent. Since the NW along armchair and Zigzag direction both show quite small lattice mismatch, the large driving force under high precursor weight allows NWs to be formed either along Zigzag or armchair directions.

To verify the microstructure of perovskite on TMDC, we successfully developed a method to allow growth of CsPbI3 on WSe2 transferred to a copper grid. From TEM analysis, both NW like and film like CsPbI3 can be observed. For the NW like shape [see Fig.3(a)], HRTEM show the lattice distance of (200) plane is 3.15 Å, agreeing with reported value for cubic CsPbI3 structure [47]. Moreover, the selected area electron diffraction (SAED) presents the same diffraction pattern as cubic phase CsPbI3 along [001] zone axis. The SAED together with the HRTEM confirms that the as-grown CsPbI3 NW is cubic structure and grow along [200] direction. Further EDX mapping and EDX spectrum [see Fig.3(d, e)] again confirm the uniform distribution of Cs, Pb and I elements, verifying the successful formation of CsPbI3. For the CsPbI3 nanofilm in Fig.3(f), nanofilm is grown along the [111] direction, the corresponding SADP present hexagonal shape. The measured (01¯1) plane lattice distance is 4.41 Å, agreeing with the previous results. Moreover, from the DP of CsPbI3 and underline WSe2, the (01¯1) plane of CsPbI3 is parallel to the (11¯0) direction of WSe2, demonstrating the epitaxial nature of CsPbI3 nanofilm. Figure S5(a) shows the XRD patterns of CsPbI3 nanostructure. Sharp diffraction peaks at 14.1°, 40.7° and 45.5° can be observed, which are ascribed to the (100), (220) and (310) planes of the cubic CsPbI3 based on the literatures [48]. The measured XRD results agree with our TEM measurement in Fig.3(c). AFM measurements of the as-grown WSe2 flake show the thickness of around 1 nm, demonstrating that the used WSe2 for CsPbI3 growth is actually monolayer (see Fig. S5 in the SI).

The band alignment of the CsPbI3/WSe2 heterostructure was determined using XPS, as shown in Fig.3(i)‒(l). The VBO is primarily derived by evaluating the energy discrepancy between the core levels of W 4f and Pb 4f and their respective energies relative to the valence band maximum (VBM) of CsPbI3 and WSe2. Consequently, the VBO of the heterostructures (denoted as ΔEV) can be accurately calculated by applying the following equation [49]:

ΔEV=(EW4fWSe2EVBMWSe2)+(EPb4fWSe2/CsPbI3EW4fWSe2/CsPbI3)(EPb4fCsPbI3EVBMCsPbI3).

The first component of Eq. (1) is obtained by subtracting the energy difference between the W 4f7/2 core level (32.35 ± 0.10 eV) and the VBM of WSe2 [Fig.3(i)]. The VBM of WSe2 is acquired by extrapolating the linear fit to the leading edge of the valence band spectra, reaching the base level with a value of 0.52 eV. Consequently, the first component of the equation is determined to be 31.83 ± 0.10 eV. Correspondingly, the energy difference between the Pb 4f7/2 core level (138.37 eV) and the VBM of CsPbI3 (0.76 eV) is measured to be 137.61 ± 0.10 eV [Fig.3(j)], representing the last component of the equation. The second part of the equation is calculated by computing the energy difference between the Pb 4f7/2 and W 4f7/2 core levels, with a value of 106.24 ± 0.10 eV [Fig.3(k)]. Based on these results, the VBO of the CsPbI3/WSe2 heterojunction is determined to be 0.46 ± 0.15 eV.

The CBO (ΔEC) can be then determined as follows:

ΔEC=EgWSe2+ΔEVEgCsPbI3,

where EgWSe2 and EgCsPbI3 are the band gap of WSe2 and CsPbI3, respectively. The band gap is 1.72 eV for CsPbI3 [50] and 1.60 eV for the WSe2 [19] substrate, respectively. Based on Eq. (2), the CBO of CsPbI3/WSe2 heterojunction is found to be 0.34 ± 0.10 eV. The extracted band offset as shown in Fig.3(l), demonstrating the type-II band alignment in the heterostructure.

The formation of both CsPbI3 nanofilm and crystal orientation tunable NWs provides a good platform to study the optical performance of this hybrid heterostructure. CsPbI3/WSe2 forms a type-II band alignment [51], providing an internal electric field to separate the photogenerated electron and holes. Raman scattering comparison of WSe2 before and after CsPbI3 growth show unobserved difference in characteristic peak intensity, width nor peak position [see Fig.4(a)], suggesting that van der Waals epitaxy process does not cause damage to the underline monolayer WSe2 substrate thanks to the low growth temperature. For the CsPbI3 NW/WSe2 as well as the CsPbI3 nanofilm/WSe2 heterostructure, two emission peaks corresponding to CsPbI3 (1.78 eV) and WSe2 (1.60 eV) can be observed with reduced emission intensity [see Fig.4(b)]. Quantitatively, the emission intensity of CsPbI3 is reduced over ten times. The slight emission energy shift as well as emission intensity difference between CsPbI3 NW and nanofilm is ascribed to the crystal quality and thickness differences. In addition, after removing of the top CsPbI3 by water washing, the emission energy as well as emission intensity is nearly unchanged, indicating that CsPbI3 growth does not cause damage to the WSe2 layer (see Fig. S7 in the SI). The corresponding TRPL decay curves in Fig.4(c) agree with the observed PL spectra changes. The PL lifetime of isolated CsPbI3 can be accurately modeled by a single-exponential function, indicating an exciton radiative recombination process [52]. The PL lifetime of pure CsPbI3 NW 7.90 ns, demonstrating a high crystal quality of as-grown CsPbI3 NWs [40]. After forming a heterostructure, PL lifetime is reduced to 4.24 ns, which is also ascribed to an exciton radiative recombination process. The charge transfer efficiency (ϕET) and charge transfer rate (KET) from CsPbI3 to WSe2 can be calculated using the following equations [53,54]:

ϕET=1τHτNW,

KET=1τH1τNW,

where τNW is the PL lifetime of CsPbI3 NW on the SiO2 substrate and τH is the PL lifetime of CsPbI3 NW on the monolayer WSe2. Based on the above equations, KET and ϕET are calculated to be 0.11 × 109 s–1 and 46%, respectively. The PL lifetime of monolayer WSe2 can be effectively modeled using a biexponential function, revealing a many-body effect lifetime (τ1) of 279 ps and an exciton radiative recombination lifetime (τ2) of 420 ps. After forming a heterostructure, the average PL lifetime of WSe2 is also dropped from 284 to 94 ps. KET and ϕET are calculated to be 0.71 × 108 s–1 and 67%, respectively. Therefore, we believe that the observed decreased PL intensity as well as PL lifetime are explained by the fast and efficient charge transfer process due to the formed type-II band alignment.

It is worth mentioning that the observed PL and TRPL trend is valid for both CsPbI3 NW and nanofilm [54]. We further performed PL intensity mapping at 1.64 eV on a CsPbI3/WSe2 heterojunction. Before measurement, the as-grown CsPbI3 film is partially removed by scratching with a tweezer, exposing the underline WSe2 [see Fig.4(d)]. The PL intensity of the WSe2 at the crack location is much brighter while the other region shows weak and uniform emission. This emission distribution confirms that the CsPbI3 film does not reduce the quality of WSe2 and the reduction of PL emission is definitely a result of heterostructure formation. The inherent characteristics of the two-dimensional structure, combined with the heightened Coulomb interaction, give rise to profound excitonic effects within the monolayers. Furthermore, the Coulomb interaction facilitates the preferential formation of trions alongside excitons, which frequently exhibit dominance in the PL spectra in the presence of freely mobile charges [55]. Further temperature dependent PL experiments are carried out from 300 K to 93 K. During cooling down process, the emission peak of CsPbI3 gradually becomes stronger and the emission energy undergoes a redshift (Fig. S8 in the SI), agreeing with previous reports [5659]. Below 93 K, the emission intensity of CsPbI3 is so strong that the emission peak from WSe2 becomes hard to distinguish. In comparison, the emission evolution of WSe2 peak at heterojunction and pure WSe2 flakes are compared in Fig.4(f)‒(h). In general, the emission of WSe2/CsPbI3 has a lower emission energy and much broader emission peak. During cooling down, the emission peak undergoes a blueshift with enhanced emission intensity. For the CsPbI3 film/WSe2, it presents a broad emission peak with energy linearly shifted from 1.58 to 1.65 eV during 300 to 93 K, which is around 12 meV smaller than the trion emission of WSe2. For the CsPbI3 NW/WSe2, a low energy peak occurs at temperature below 273 K and becomes stronger during cooling down. Since the laser spot diameter is larger than the NW diameter, the emission consists of pure WSe2 (higher energy peak) and heterostructure (lower energy shoulder). The exact position of the low energy peak is sample dependent and is always lower than the trion emission of WSe2 [see Fig.4(h)]. Moreover, after removing of the CsPbI3 by water washing, no such a low energy emission peak is observed (see Fig. S9 in the SI), demonstrating that this low energy peak is not caused by the doping or damage of the TMDCs during CsPbI3 epitaxy. Consequently, this emission is ascribed to the band alignment of the CsPbI3/WSe2 heterostructure.

To test whether the revealed van der Waals growth fundamental of CsPbI3 is only valid for WSe2 or universal valid for other 2D materials, we tried to grow CsPbI3 nanofilm and NWs on monolayer WS2, MoS2 and MoSe2 at the same growth conditions as those on monolayer WSe2. As displayed by the optical images in Fig.5, CsPbI3 nanofilms are selectively formed on TMDCs under the same growth conditions. For CsPbI3 NW/TMDC heterojunction, NWs are formed on TMDCs with different density and length. The general geometric relationship between the NW and the TMDCs layer is the same, most of the NWs grow along the Zigzag direction with the rest along armchair directions. Indeed, we also successfully grow CsPbI3 on multilayer WSe2, transferred WSe2 as well as multilayer h-BN using the standard film growth condition (see Fig. S10 in the SI). These results demonstrate that the revealed growth fundamental of CsPbI3 is nearly independent on the physical properties of the underline 2D materials but is universal valid. This unique growth behavior of CsPbI3 provides an advantage of forming different types of CsPbI3/2D material heterojunction as demanded, which is highly suitable for novel optoelectronic device applications.

Similar to those CsPbI3/WSe2 heterojunction, no change could be observed for Raman scattering of monolayer TMDCs before and after CsPbI3 growth. PL quenching is also observed for all the CsPbI3/TMDC heterojunction, especially for the monolayer WS2 related heterojunction. Slightly peak shift is observed, since trion emission is sensitive to the dielectric environment. These results suggest the CsPbI3 forms a type-II band alignment with all the monolayer TMDCs. Consequently, the internal electric field induces fast carrier transfer in these heterojunctions, thus reducing the recombination chance of photoexcited electrons and holes.

The optical emission of CsPbI3/TMDC are further studied at low temperature, as shown in Fig.6 Similar to CsPbI3/WSe2 heterostructure, CsPbI3/WS2 and CsPbI3/MoSe2 also show similar emission behaviors. When compared with pure WS2 and MoSe2, a broad and low energy emission peak is always observed as a shoulder to TMDCs emission peak. The extracted peak energy evolution with temperature is shown in Fig.6(e, f) together with the evolution of trion and exciton for pure WS2 and MoSe2. For pure WS2 and MoSe2, trion and exciton emission shows a linear blueshift with decreasing temperature. In the case of the CsPbI3 NW/WS2 heterojunction, a low-energy peak is observable during the whole investigated temperature range. When temperature is below 153K, this low energy peak even outweighs the emission of pure WS2. The lowest emission energy is around 80 meV lower than the trion emission of WS2. It is worth mentioning that CsPbI3/WS2 heterojunction induced emission energy (1.93 eV) is still larger than that of CsPbI3. Based on the band alignment between CsPbI3 and TMDC layers in Fig.6(g) [19], even though the heterostructure is supposed to induce a type-II emission with lower energy, this energy should be smaller than the bandgap of both CsPbI3 and TMDC. Therefore, the observed lower emission energy peak in WS2/CsPbI3 is not related to the type-II band alignment. In terms of CsPbI3 NW/MoSe2 heterojunction, a low-energy peak at around 1.48 eV is observed when temperature is below 153 K. This peak energy is 72 meV lower than the trion emission of MoSe2. At low temperature, the emission of CsPbI3 and MoS2 overlap with each other, thus is not shown here.

In all, for all the fabricated CsPbI3/monolayer TMDC, it forms a type-II band alignment, which leads to a drop of PL emission due to fast charge transfer. At low temperature, band misalignment induced PL emission is not observed, probably because photo induced charges can diffuse in CsPbI3, which reduce the possibility of forming interlayer exciton at the interface as those in pure TMDC heterostructure [56]. Instead, the fabricated heterostructure change the emission behavior of TMDC layer. Firstly, the dominant emission at room temperature is changed from exciton to trion, leading to a redshift of the PL emission spectrum. Secondly, a broad emission peak with energy around several tens meV lower than the trion emission can be observed, which is not aroused by defects as well as band alignment. Instead, it is supposed that this band alignment induced charge injection from CsPbI3 to TMDCs layer alter the recombination paths in TMDCs. Consequently, this emission energy and intensity is sensitive to the CsPbI3.

The determined type-II band alignment together with the ability to re-grown CsPbI3 on transferred TMDC, suggesting that this method is able to enhance the photodetection performance of TMDC based photodetector. Thus, after metal contact to the monolayer WSe2 (see optical image in the inset of Fig.7), CsPbI3 film was regrown on the fabricated WSe2 devices. The I‒V curves before and after CsPbI3 growth are compared in Fig.7 with a radiation of a 532 nm laser. The growth of CsPbI3 significantly enhance the dark current, because the grown CsPbI3 increase the dark current, which is in agreement with previous WSe2‒CH3NH3PbI3 heterostructure devices [60]. The photocurrent and on/off ratio are also largely enhanced as well under all the applied voltage range. Specifically, photocurrent increases from 2.38 to 38.59 nA and the on/off ratio of CsPbI3/WSe2 increases from 3.14 to 16.37 under voltage of −1 V. The enhancement of optoelectronic performance agrees with our expectation, since the CsPbI3 shows large light absorption coefficients and the fast charge transfer process can increase the photoinduced carrier density and thus the photocurrent. The photo response characteristics indicate that the hybrid CsPbI3/WSe2 possesses a great potential in the application of photodetectors.

4 Conclusions

In summary, we demonstrate direct van der Waals epitaxy of CsPbI3 NWs and thickness tunable CsPbI3 nanofilms on WSe2 without causing any damage to the monolayer WSe2 substrate. The low adsorption energy of CsI and PbI2 adatoms on TMDC substrate make it possible to selectively grow CsPbI3 on TMDC layer instead of the amorphous SiO2 substrate. Moreover, the temperature dependent desorption rate of the precursor leads to possibility of controlling the morphology of CsPbI3 from nanofilm to Zigzag/armchair orientated NWs. Both the CsPbI3 nanofilm and NWs display a distinct inclination towards the formation of a cubic phase structure, establishing an epitaxial relationship with the growth substrate. The revealed van der Waals growth fundamental of CsPbI3 is valid for all the TMDC layers, including but not limited to CVD grown monolayer/multilayer TMDC as well as h-BN, which pose great feasibility to design CsPbI3 based van der Waals heterostructure for different application purpose. Further XPS and optical characterization confirms the type-II band alignment between CsPbI3/monolayer TMDC, thus leading to a fast charge transfer process and the resulted reduction of PL emission intensity. Also, the band alignment induced carrier injection seems alters the recombination paths in TMDC monolayer, leading to the occurrence of a broad PL peak at lower energy side of pure TMDC emission. The WSe2/CsPbI3 heterostructure photodetectors exhibit enhanced photocurrent and on/off ratio. Therefore, our finding suggests a new approach to alter the emission as well as optoelectrical performance in TMDC layer.

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