Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
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Published Online
2007-12-05
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Abstract
An AlAs layer of two or three monolayers was inserted beneath the strained InAs layer in the fabrication of InAs nanostructure on the In0.53Ga0.47As and In0.52Al0.48As buffer layer lattice-matched to InP(001) substrate using molecular beam epitaxy. The effects of AlAs insertion on the InAs nanostructures were investigated and discussed.
L? Xiao-jing, WU Ju, XU Bo, ZENG Yi-ping, WANG Biao-qiang, WANG Zhan-guo.
InAs nanostructures on InP (001) substrate with the insertion of a superthin AlAs layer.
Front. Phys., 2007, 2(4): 440-445 DOI:10.1007/s11467-007-0055-y