GaN metal–oxide–semiconductor field-effect transistors on AlGaN/GaN heterostructure with recessed gate

Qingpeng WANG , Jin-Ping AO , Pangpang WANG , Ying JIANG , Liuan LI , Kazuya KAWAHARADA , Yang LIU

Front. Mater. Sci. ›› 2015, Vol. 9 ›› Issue (2) : 151 -155.

PDF (897KB)
Front. Mater. Sci. ›› 2015, Vol. 9 ›› Issue (2) : 151 -155. DOI: 10.1007/s11706-015-0286-8
RESEARCH ARTICLE
RESEARCH ARTICLE

GaN metal–oxide–semiconductor field-effect transistors on AlGaN/GaN heterostructure with recessed gate

Author information +
History +
PDF (897KB)

Keywords

gallium nitride / MOSFET / recess gate / dry etching

Cite this article

Download citation ▾
Qingpeng WANG, Jin-Ping AO, Pangpang WANG, Ying JIANG, Liuan LI, Kazuya KAWAHARADA, Yang LIU. GaN metal–oxide–semiconductor field-effect transistors on AlGaN/GaN heterostructure with recessed gate. Front. Mater. Sci., 2015, 9(2): 151-155 DOI:10.1007/s11706-015-0286-8

登录浏览全文

4963

注册一个新账户 忘记密码

References

[1]

Milligan J W, Sheppard S, Pribble W, . SiC and GaN wide bandgap device technology overview. Radar Conference, 2007 IEEE, 960–964

[2]

Christou A, Fantini F. Introduction to the Special Issue on GaN and related nitride compound device reliability. IEEE Transactions on Device and Materials Reliability, 2008, 8(2): 239

[3]

Niiyama Y, Ootomo S, Kambayashi H, . Normally-off operation GaN based MOSFETs for power electronics. CISC 2009, Annual IEEE, 2009, 1–4

[4]

Matocha K, Chow T P, Gutmann R J. High-voltage normally off GaN MOSFETs on sapphire substrates. IEEE Transactions on Electron Devices, 2005, 52(1): 6–10

[5]

Wang Q, Tamai K, Miyashita T, . Influence of dry recess process on enhancement-mode GaN metal–oxide–semiconductor field-effect transistors. Japanese Journal of Applied Physics, 2013, 52(1S): 01AG02

[6]

Ao J P, Yamaoka Y, Okada M, . Investigation on current collapse of AlGaN/GaN HFET by gate bias stress. IEICE Transactions on Electronics, 2008, 91(7): 1004–1008

[7]

Wang Q, Jiang Y, Miyashita T, . Process dependency on threshold voltage of GaN MOSFET on AlGaN/GaN heterostructure. Solid-State Electronics, 2014, 99: 59–64

[8]

Ohmi T, Kotani K, Teramoto A, . Dependence of electron channel mobility on Si-SiO2 interface microroughness. Electron Device Letters, IEEE, 1991, 12(12): 652–654

RIGHTS & PERMISSIONS

Higher Education Press and Springer-Verlag Berlin Heidelberg

AI Summary AI Mindmap
PDF (897KB)

1128

Accesses

0

Citation

Detail

Sections
Recommended

AI思维导图

/