Impact of surface phase coexistence on the development of step-free areas on Si(111)
Andreas FISSEL, Ayan Roy CHAUDHURI, Jan KRÜGENER, Philipp GRIBISCH, H. Jörg OSTEN
Impact of surface phase coexistence on the development of step-free areas on Si(111)
The step-flow growth condition of Si on Si(111) near the (7×7)-"1×1" surface phase transition temperature TC are analyzed within the framework of Burton--Cabrera--Frank theory. In particular, coexistence of both surface phases well below TC and their specific influence on the step-flow growth behavior are considered. We presume that under dynamical condition of growth, the surface initially covered by only the (7×7) phase separates into domains surrounded by "1×1" areas. On such a surface, the overall supersaturation should be reduced drastically compared to a surface with only (7×7), resulting in much larger critical terrace width for nucleation.
molecular beam epitaxy / step-flow growth mode / surface superstructure / silicon
[1] |
Fissel A, Krügener J, Osten H J. Preparation of large step-free mesas on Si(111) by molecular beam epitaxy. physica status solidi (c), 2012, 10–11: 2050–2053
|
[2] |
Krügener J, Osten H J, Fissel A. Morphology of mesa surfaces on Si(111) prepared by molecular beam epitaxy at temperatures around the (7×7)-"1×1" surface phase transition. Surface Science, 2013, 618: 27–35
|
[3] |
Hannon J B, zu Heringdorf F J, Tersoff J,
|
[4] |
Hannon J B, Tersoff J, Tromp R M. Surface stress and thermodynamic nanoscale size selection. Science, 2002, 295(5553): 299–301
|
[5] |
Hannon J B, Tersoff J, Reuter M C,
|
[6] |
Yang Y, Williams E D. High atom density in the "1×1" phase and origin of the metastable reconstructions on Si(111). Physical Review Letters, 1994, 72(12): 1862–1865
|
[7] |
Burton W K, Cabrera N, Frank F C. The growth of crystals and the equilibrium structure of their surfaces. Philosophical Transactions of the Royal Society of London. Series A: Mathematical and Physical Sciences, 1951, 243(866): 299–358
|
[8] |
Desai P D. Thermodynamic properties of iron and silicon. Journal of Physical and Chemical Reference Data, 1986, 15(3): 967–982
|
[9] |
Peng A B, Man K L, Altman M S,
|
[10] |
Pimpinelli A, Villain J, Wolf D E,
|
[11] |
Hibino H, Hu C W, Ogino T,
|
[12] |
Ol'shanetskii B Z, Repinskii S M, Shklyaev A A. Possibility of investigating surface self-diffusion of silicon by slow-electron diffraction methode. Journal of Experimental and Theoretical Physics Letters, 1978, 27(7): 378–380
|
[13] |
Hannon J B, Hibino H, Bartelt N C,
|
[14] |
Watanabe H, Ichikawa M. Kinetics of vacancy diffusion on Si(111) surfaces studied by scanning reflection electron microscopy. Physical Review B, 1996, 54(8): 5574–5580
|
[15] |
Cho K, Kaxiras E. Intermitted diffusion on the reconstructed Si(111) surface. Europhysics Letters, 1997, 39(3): 287–292
|
[16] |
Bedair S M. Activation energy for migration of silicon (111) face. Surface Science, 1974, 42(2): 595–599
|
[17] |
Sato T, Kitamura Sh, Iwatsuki M. Surface diffusion of adsorbed Si atoms on the Si(111)7×7 surface studied by atom-tracking scanning tunneling microscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2000, 18(3): 960–964
|
[18] |
NoorBatcha I, Raff L M, Thompson D L,
|
[19] |
Hibino H, Homma Y, Uwaha M,
|
[20] |
Zinovyev V A, Balandin V Yu, Aleksandrov L N,
|
/
〈 | 〉 |