Influence of deposition temperature on the structure and optical properties of HfO thin films

Abstract

Hafnium oxide (HfO₂) thin films were deposited on Si (001) substrates by electron beam evaporation at various growth temperatures. It was found that the film was amorphous when deposited at temperatures lower than 200°C. It was polycrystalline when deposited at 250°C and 300°C. At temperatures above 400°C, it was grown preferably along the 等标签切断的公式，并移除 \begin{document} html = html.replace(/\$([\s\S]+?)\$/g, function(match, formula) { let clean = formula.replace(/<[^>]+>/g, '') // 删掉公式内部的 HTML 标签 .replace(/\\begin\{document\}/g, '') .replace(/\\end\{document\}/g, '') .replace(/ /g, ' '); // 修复空格实体 return '$' + clean.trim() + '$'; }); // B. 清理残留的预览层和无效 ID (防止 MathJax 跳过) container.innerHTML = html; $(container).find('.MathJax_Preview, .MathJax_Display, .MathJax').remove(); // --- 3. 触发渲染 --- if (window.MathJax && MathJax.Hub) { // 确保配置允许解析 $...$ MathJax.Hub.Config({ tex2jax: { inlineMath: [['$','$'], ['\\(','\\)']] } }); MathJax.Hub.Queue(["Typeset", MathJax.Hub, container]); } } $(document).ready(function() { mag_renderAllMath('zhaiyaojs_text'); });

Keywords

hafnium oxide (HfO₂) / growth temperature / structure / texture / refractive index

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