Influence of deposition temperature on the structure and optical properties of HfO thin films

Abstract

Hafnium oxide (HfO₂) thin films were deposited on Si (001) substrates by electron beam evaporation at various growth temperatures. It was found that the film was amorphous when deposited at temperatures lower than 200°C. It was polycrystalline when deposited at 250°C and 300°C. At temperatures above 400°C, it was grown preferably along the

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