Review of fabrication methods of large-area transparent graphene electrodes for industry

Abstract

Graphene is a two-dimensional material showing excellent properties for utilization in transparent electrodes; it has low sheet resistance, high optical transmission and is flexible. Whereas the most common transparent electrode material, tin-doped indium-oxide (ITO) is brittle, less transparent and expensive, which limit its compatibility in flexible electronics as well as in low-cost devices. Here we review two large-area fabrication methods for graphene based transparent electrodes for industry: liquid exfoliation and low-pressure chemical vapor deposition (CVD). We discuss the basic methodologies behind the technologies with an emphasis on optical and electrical properties of recent results. State-of-the-art methods for liquid exfoliation have as a figure of merit an electrical and optical conductivity ratio of \mathrm{43.5}, slightly over the minimum required for industry of \mathrm{35}, while CVD reaches as high as \mathrm{419}.

Graphical abstract

Keywords

transparent electrodes / graphene / liquid exfoliation / chemical vapor deposition (CVD)

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Acknowledgements

The work has received funding from the European Union’s Horizon 2020 research and innovation programme under grant agreement GrapheneCore2 number 785219, and GrapheneCore3 number 881603. We acknowledge the financial support from Academy of Finland (projects 298297 and 320167-PREIN Flagship).ƒ

Funding note

Open access funding provided by Aalto University.

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