Fabrication of buried channel optical waveguide splitter

Front. Optoelectron. ›› 2009, Vol. 2 ›› Issue (1) : 28 -30.

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Front. Optoelectron. ›› 2009, Vol. 2 ›› Issue (1) : 28 -30. DOI: 10.1007/s12200-008-0042-0
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Fabrication of buried channel optical waveguide splitter

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Abstract

An electric field technique was developed to fabricate buried channel waveguides on optical glass. A voltage of 800 V was applied on the glass to accelerate the field-driven ion exchange process by expeditiously replacing host sodium ions in the glass with silver ions. As a result, the optical loss for channel waveguides was measured using the edge coupling technique with a He-Ne laser. Loss of 0.35 dB/cm was obtained for the channel waveguides with 25 μm in depth, which is relatively low for waveguides of such depth at red wavelength band.

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null. Fabrication of buried channel optical waveguide splitter. Front. Optoelectron., 2009, 2(1): 28-30 DOI:10.1007/s12200-008-0042-0

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