POCl₃ diffusion for industrial Si solar cell emitter formation

Abstract

POCl₃ diffusion is currently the de facto standard method for industrial n-type emitter fabrication. In this study, we present the impact of the following processing parameters on emitter formation and electrical performance: deposition gas flow ratio, drive-in temperature and duration, drive-in O₂ flow rate, and thermal oxidation temperature. By showing their influence on the emitter doping profile and recombination activity, we provide an overall strategy for improving industrial POCl₃ tube diffused emitters.

Graphical abstract

Keywords

POCl₃ diffusion / emitter recombination / oxidation / silicon

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