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Application of rapid thermal processing on SiN thin film to solar
cells
- LI Youjie1, LUO Peiqing1, ZHOU Zhibin1, CUI Rongqiang1, HUANG Jianhua2, WANG Jingxiao2
Author information
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1.Solar Energy Institute, Shanghai Jiao Tong University; 2.Photovoltaic D&R Center of Linyang, Shanghai Jiao Tong University;
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History
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Published |
05 Dec 2008 |
Issue Date |
05 Dec 2008 |
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References
1. Zhang Sudong . Research on the Thermal stability of SiNx thin films for back passivation. In: : Feng Linghuan ed. 2006 New Photovoltaiic Developmnt in the China. Chengdu: North-west Jiaotong UniversityPress, 2006, 746–749 (in Chinese)
2. Zha Chaolin . Research on the rapidly thermal diffusion characteres and the furnace. In: : Yan Luguang ed. 21 Century New Soalar Technics. Shanghai: Shanghai Jiaotong UniversityPress, 2003, 58–61 (in Chinese)
3. Wang Jingxiao . PC1D solar cell performance simulation software. In: : Yan Luguang ed. 21 Century New SoalarTechnics. Shanghai: Shanghai Jiaotong University Press, 2003, 41–43 (in Chinese)
4. Chen Z, Pang S K, Yasutake K . Plasma-enhanced chemical-vapor-deposited oxide for lowsurface recombination velocity and high effective lifetime in silicon. Journal of Applied Physics, 1993, 74(4): 2856–2859. doi:10.1063/1.354638
5. Wieringen A C, Warmoltz N . On the permeation of hydrogenand helium in single crystal silicon and germanium at elevated temperatures. Physica, 1956, 22(6): 849–865. doi:10.1016/S0031-8914(56)90039-8
6. Rohatgi A . Designsand fabrication technologies for future commercial crystalline Sisolar Cells. In: : Sopori B L, Kalejs J, eds. 15thWorkshop on Crystalline Silicon Solar Cells and Modules: Materialsand Processes. Colorado: Vail Cascade Resort, 2005, 11–22
7. Chen Fengxiang . Silicon Surfacece and bulk defect passivation by PECVD. Acta Energiae Solaris Sinica, 2003, 24(3): 348–351(in Chinese)