封面图片
2019年, 第13卷 第3期
(Bin Xu, Toshiro Kaneko, Toshiaki Kato, pp. 517-524)
This cover figure shows an innovative growth method of SWNTs with narrow-chirality distribution, named pulse plasma chemical vapor deposition (CVD). The growth yield of the SWNTs could be improved by repetitive short duration pulse plasma CVD, while maintaining the initial narrow chirality distribution. This study on the precise time-scale incubation dynamics controlling the growth of SWNTs during pulse plasma CVD offers novel insights for the development of chirality-controlled SWNTs.
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ISSN 2095-0179 (Print)
ISSN 2095-0187 (Online)
CN 11-5981/TQ
Postal Subscription Code 80-969 Formerly Known as Frontiers of Chemical Science and Engineering in China 2018 Impact Factor: 2.809