In this paper, a theoretical analysis of how the excitation conditions affect the sapphire fiber Fabry-Perot interferometer (SFPI) visibility was performed. The conditions were considered, in which an SFPI was excited by a single-mode fiber (SMF), a multimode fiber (MMF), and a fiber collimator. The finite difference method (FDM) was used to realize the numerical solution of the modal electric fields, and then, the modal excited distributions in the sapphire fiber and the SFPI visibility were calculated. The results showed that different numbers of modes were excited in sapphire fibers under different excitation conditions and finally affected the fringe visibility of the SFPI. The fiber collimator excited the fewest modes and the visibility remained at the highest level. Finally, an experiment was performed, and the experimental results agreed well with the theoretical results.

For expanding the amplitude-frequency response range of the differential cross-phase multiply (DCM) algorithm in the φ-OTDR system, a temporal spline interpolation (TSI) method is proposed to pre-process Rayleigh backscattering (RBS) signals. Through the TSI method, the discrete temporal signals characterizing RBS traces are subjected to interpolation, facilitating a reduction in differential approximation errors. This, in turn, establishes a heightened level of precision in phase demodulation, especially relevant across extensive sensing distances. By comparing the recovered time-domain waveforms and the corresponding power spectral densities without and with the TSI, the above improvement effect has been experimentally validated by utilizing the TSI. The results show that, with the TSI, the amplitude-frequency response range of the DCM algorithm is enlarged by 2.78 times, and the new relationship among f_pulse, f, and D under the root mean square error (RMSE) tolerance less than 0.1 can be expressed as 1.9(D+1)f ≤ f_pulse. This contribution underscores a substantial advancement in the capabilities of the DCM algorithm, holding promise for refined performance in optical fiber sensing applications.

This article proposes a line scanning chromatic confocal sensor to solve the problem of limited chromatic confocal measurement due to the small measurement range and low measurement efficiency in the industrial inspection process. To obtain an extensive dispersion range, the advantages of a simple single-axis structure are combined with the advantages of a large luminous flux of a biaxial structure. Considering large-scale measurement, our sensor uses off-axis rays to limit the illumination path and imaging path to the same optical path structure. At the same time, the field of view is expanded, and a symmetrical structure is adopted to provide a compact optical path and improve space utilization. The simulation and physical system test results shows that the sensor scanning line length is 12.5 mm, and the axial measurement range in the 450 nm to 750 nm band is better than 20 mm. The axial resolution of the detector is ±1 µm combined with the subpixel centroid extraction data processing method, and the maximum allowable tilt angle for specular reflection samples is ±7°. The thicknesses of transparent standard flat glass and the wet collagen membrane are measured. The maximum average error is 1.3 µm, and the relative error is within 0.7%. The constructed sensor is of great significance for rapidly measuring the three-dimensional profile, flatness, and thickness in the fields of transparent biological samples, optics, micromechanics, and semiconductors.

Since the discovery of the extraordinary optical transmission phenomenon, nanohole arrays have attracted much attention and been widely applied in sensing. However, their typical fabrication process, utilizing photolithographic top-down manufacturing technologies, has intrinsic drawbacks including the high costs, time consumption, small footprint, and low throughput. This study presented a low-cost, high-throughput, and scalable method for fabricating centimeter-scale (1×2 cm²) nanohole arrays using the improved nanosphere lithography. The large-scale close-packed polystyrene monolayers obtained by the hemispherical-depression-assisted self-assembly method were employed as colloidal masks for the nanosphere lithography, and the nanohole diameter was tuned from 233 nm to 346 nm with a fixed period of 420 nm via plasma etching. The optical properties and sensing performance of the nanohole arrays were investigated, and two transmission dips were observed due to the resonant coupling of plasmonic modes. Both dips were found to be sensitive to the surrounding environment, and the maximum bulk refractive index sensitivity was up to 162.1 nm/RIU with a 233 nm hole diameter. This study offered a promising approach for fabricating large-scale highly ordered nanohole arrays with various periods and nanohole diameters that could be used for the development of low-cost and high-throughput on-chip plasmonic sensors.