Catalyst Enhanced Chemical Vapor Deposition of Nickel on Polymer Surface

Abstract

Catalyst enhanced chemical vapor deposition of nickel film on high T _g polymers such as teflon (PTFE), polyimide(PI), and polysulfone(PS) was investigated by hot wall and cold wall CVD, in which Ni(dmg)₂, Ni(acac)₂, Ni(hfac)₂, Ni(TMHD)₂, and Ni(cp)₂ are used as precursors, and palladium complexes are used as catalysts. The films obtained were shiny with silvery color. The Ni was metallic and the purity of Ni was about 92%-95% from XPS analysis. SEM micrographs show that the film had good morphology. The conductivity of the film was about 0.5-4 Ω·cm^-1. Ni films had good adhesion with polyimide and polysulfone.

Keywords

catalyst enhanced chemical vapor deposition / teflon / polyimide(PI) / polysulfone(PS) / nickel film / palladium complex catalyst

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