Influence of aluminum ions implantation on corrosion behavior of zircaloy-2 alloy in 1 M H₂SO₄

Abstract

The specimens were implanted with aluminum ions with fluence ranging from 1×10₁₆ to 1×10₁₇ ions/cm₂ to study the effect of aluminum ion implantation on the aqueous corrosion behavior of zircaloy-2 by metal vapor vacuum arc source (MEVVA) at an extraction voltage of 40 kV. The valence states and depth distributions of elements in the surface layer of the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES), respectively. Transmission electron microscopy (TEM) was used to examine the microstructure of the aluminum-implanted samples. Glancing angle X-ray diffraction (GAXRD) was employed to examine the phase transformation due to the aluminum ion implantation. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted zircaloy-2 in a 1 M H₂SO₄ solution. It is found that a significant improvement was achieved in the aqueous corrosion resistance of zircaloy-2 implanted with aluminum ions. Finally, the mechanism of the corrosion behavior of aluminum-implanted zircaloy-2 was discussed.

Keywords

zircaloy-2 / corrosion resistance / aluminum ion implantation / X-ray photoelectron spectroscopy (XPS) / auger electron spectroscopy (AES)

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