Preparation and properties of a-Si:H thin films deposited on different substrates

Abstract

The effects of different substrates on the structure and hydrogen evolution from a-Si: H thin films deposited by plasma enhanced chemical vapour deposition were studied, as well as the similar films exposed to an hydrogen plasma. Spectroscopic ellipsometry and hydrogen evolution measurements were used to analyse the effects of the substrate and hydrogen plasma on the films microstructure, thickness, hydrogen content, hydrogen bonding and hydrogen evolution. The hydrogen evolution spectra show a strong substrate dependence. In particular on crystalline silicon substrate, the formation of bubbles was observed. For different substrates, hydrogen plasma treatments lightly affected the hydrogen evolution spectra. These results indicate that the action of hydrogen in a-Si:H was modified by the nature of the substrate.

Keywords

a-Si:H thin film / substrate / spectroscopic ellipsometry / hydrogen evolution

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