Oxygen vacancy induced carrier mobility enhancement in nano-multilayered ZrO2:Y2O3/SrTiO3 thin films for non-volatile memory devices

Ze-ou Yang , Xiao-zhong Huang , Hai-long Hu , Bing-yang Ma , Hai-long Shang , Jian-ling Yue

Journal of Central South University ›› 2024, Vol. 31 ›› Issue (10) : 3674 -3687.

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Journal of Central South University ›› 2024, Vol. 31 ›› Issue (10) : 3674 -3687. DOI: 10.1007/s11771-024-5730-4
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Oxygen vacancy induced carrier mobility enhancement in nano-multilayered ZrO2:Y2O3/SrTiO3 thin films for non-volatile memory devices

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The influence of oxygen vacancy-dominated carrier mobility on the performance of memristors has attracted considerable attention. The device’s carrier mobility can be significantly improved by forming a nano-multilayered heterostructure when the individual layer thickness is below a critical value. In this work, Pt/[ZrO2: Y2O3 (YSZ)/SrTiO3 (STO)] n/Nb:SrTiO3 (NSTO) memristive devices were configurated through laser pulse deposited YSZ/STO nano-multilayered active layer with both Pt and NSTO acting as top and counter electrodes. Specifically, the Pt/[YSZ/STO]5/NSTO device with five consecutive layers of YSZ/STO thin film shows superior memristor performance, and its corresponding carrier mobility presents a significantly enhanced value compared to that of other periodic numbers of YSZ/STO composed memristive devices. This can be attributed to the increase of oxygen vacancy concentration in the device, as evidenced by both experimental results and theoretical analysis. This work provides a significant approach in improving the performance of memristor dominated by oxygen vacancy transporting mechanism.

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Ze-ou Yang,Xiao-zhong Huang,Hai-long Hu,Bing-yang Ma,Hai-long Shang,Jian-ling Yue. Oxygen vacancy induced carrier mobility enhancement in nano-multilayered ZrO2:Y2O3/SrTiO3 thin films for non-volatile memory devices. Journal of Central South University, 2024, 31(10): 3674-3687 DOI:10.1007/s11771-024-5730-4

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