Β-Ga2O3 diodes with ultra-high surge current enabled by Ag/AMB-AlN flip-chip packaging
Zi-Lin Hao , Chen-Yi Dai , Zheng Zhang , Yuan-Xi Jia , Xue-Feng Wu
Journal of Electronic Science and Technology ›› 2026, Vol. 24 ›› Issue (1) : 100347
Owing to superior breakdown voltage and excellent robustness, the beta-gallium oxide (β-Ga2O3) power device has emerged as a pivotal research frontier in power electronics. Although advanced packaging strategies, including nano-silver paste sintering, alumina direct bond copper (DBC) substrates, and flip-chip structures, have been adopted to mitigate the intrinsic low thermal conductivity of β-Ga2O3. However, a further reduction in the thermal resistance while maintaining high reliability remains a challenge. This study introduces a novel packaging methodology that synergistically integrates nano-silver films with aluminum nitride active metal brazing (AMB-AlN) substrates, achieving an ultra-low junction-to-case thermal resistance. By comprehensive reliability assessments on β-Ga2O3 Schottky barrier diodes (SBDs) and hetero-junction diodes (HJDs), the results demonstrate that the SBDs and HJDs exhibit surge current densities of 0.876 kA/cm2 and 0.778 kA/cm2, respectively, which represents a significant advancement in device performance benchmarks. These advancements provide critical insights into packaging design for high-reliability ultrawide bandgap semiconductor systems.
Flip-chip packaging / Surge robustness / Thermal resistance / Ultrawide bandgap semiconductor / β-Ga2O3
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