An industrial solution to light-induced degradation of crystalline silicon solar cells

Meng XIE , Changrui REN , Liming FU , Xiaodong QIU , Xuegong YU , Deren YANG

Front. Energy ›› 2017, Vol. 11 ›› Issue (1) : 67 -71.

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Front. Energy ›› 2017, Vol. 11 ›› Issue (1) : 67 -71. DOI: 10.1007/s11708-016-0430-x
RESEARCH ARTICLE
RESEARCH ARTICLE

An industrial solution to light-induced degradation of crystalline silicon solar cells

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Abstract

Boron-oxygen defects can cause serious light-induced degradation (LID) of commercial solar cells based on the boron-doped crystalline silicon (c-Si), which are formed under the injection of excess carriers induced either by illumination or applying forward bias. In this contribution, we have demonstrated that the passivation process of boron-oxygen defects can be induced by applying forward bias for a large quantity of solar cells, which is much more economic than light illumination. We have used this strategy to trigger the passivation process of batches of aluminum back surface field (Al-BSF) solar cells and passivated emitter and rear contact (PERC) solar cells. Both kinds of the treated solar cells show high stability in efficiency and suffer from very little LID under further illumination at room temperature. This technology is of significance for the suppression of LID of c-Si solar cells for the industrial manufacture.

Keywords

Boron-oxygen defects / c-Si solar cells / light-induced degradation / passivation / forward bias

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Meng XIE, Changrui REN, Liming FU, Xiaodong QIU, Xuegong YU, Deren YANG. An industrial solution to light-induced degradation of crystalline silicon solar cells. Front. Energy, 2017, 11(1): 67-71 DOI:10.1007/s11708-016-0430-x

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References

[1]

Bothe K, Hezel R, Schmidt J. Recombination-enhanced formation of the meta stable boron–oxygen complex in crystalline silicon. Applied Physics Letters, 2003, 83(6): 1125–1127

[2]

Fischer H, Pschunder W. Investigation of photon and thermal induced changes in silicon solar cells. In: Proceedings of the 10th IEEE Photovoltaic Specialists Conference. Alto P, Calif, 1974, 404–411

[3]

Lim B, Hermann S, Bothe K, Schmidt J, Brendel R. Solar cells on low-resistivity boron-doped Czochralski-grown silicon with stabilized efficiencies of 20%. Applied Physics Letters, 2008, 93(16): 162102

[4]

Bothe K, Sinton R, Schmidt J. Fundamental boron-oxygen-related carrier lifetime limit in mono and multicrystalline silicon. Progress in Photovoltaics: Research and Applications, 2005, 4(13): 287–296

[5]

Schmidt J, Bothe K. Structure and transformation of the meta stable boron-and oxygen-related defect center in crystalline silicon. Physical Review B: Condensed Matter and Materials Physics, 2004, 69(2): 024107

[6]

Voronkov V V, Falster R. Latent complexes of interstitial boron and oxygen dimers as a reason for degradation of silicon-based solar cells. Journal of Applied Physics, 2010, 107(5): 053509

[7]

Schmidt J, Aberle A G, Hezel R. Investigation of carrier lifetime instabilities in Cz-grown silicon. In:Proceedings of the 26th IEEE Photovoltaic Specialists Conference . Anaheim, 1997

[8]

Herguth A, Schubert G, Kaes M, Hahn G. Investigations on the long time behavior of the metastable boron-oxygen complex in crystalline silicon. Progress in Photovoltaics: Research and Applications, 2008, 16(2): 135–140

[9]

Glunz S W, Rein S, Warta W, Knobloch J, Wettling W. Degradation of carrier lifetime in Cz silicon solar cells. Solar Energy Materials and Solar Cells, 2001, 65(1–4): 219–229

[10]

Yoshida T, Kitagawara Y. Bulk lifetime decreasing phenomena induced by light-illumination in high-purity p-type CZ-Si crystals. In: Proceedings of the 4th International Symposium on High Purity Silicon IV, 1996, 450–454

[11]

Glunz S W, Rein S, Knobloch J, Wettling W, Abe T. Comparison of boron and gallium doped p-type Czochralski silicon for photovoltaic application. Progress in Photovoltaics: Research and Applications, 1999, 7(6): 463–469

[12]

Yu X, Wang P, Chen P, Li X, Yang D. Suppression of boron-oxygen defects in p-type Czochralski silicon by germanium doping. Applied Physics Letters, 2010, 97(5): 051903

[13]

Wu Y, Yu X, He H, Chen P, Yang D. Suppression of boron-oxygen defects in Czochralski silicon by carbon co-doping. Applied Physics Letters, 2015, 106(10): 102105

[14]

Herguth A, Schubert G, Kaes M, Hahn G. Avoiding boron-oxygen related degradation in highly boron doped Cz silicon. In: Proceedings of the 21st European Photovoltaic Solar Energy Conference, 2006, 530–537

[15]

Lim B, Bothe K, Schmidt J. Deactivation of the boron-oxygen recombination center in silicon by illumination at elevated temperature. Physica Status Solidi (RRL)-Rapid Research Letters, 2008, 2(3): 93–95

[16]

Lim B, Bothe K, Schmidt J. Impact of oxygen on the permanent deactivation of boron-oxygen-related recombination centers in crystalline silicon. Journal of Applied Physics, 2010, 107(12): 123707

[17]

Lim B, Liu A, Macdonald D, Bothe K, Schmidt J. Impact of dopant compensation on the deactivation of boron-oxygen recombination centers in crystalline silicon. Applied Physics Letters, 2009, 95(95): 232109

[18]

Wilking S, Herguth A, Hahn G. Influence of hydrogen on the regeneration of boron-oxygen related defects in crystalline silicon. Journal of Applied Physics, 2013, 113(19): 194503

[19]

Lim B, Bothe K, Schmidt J. Accelerated deactivation of the boron-oxygen-related recombination centre in crystalline silicon. Semiconductor Science and Technology, 2011, 26(9): 95009–95011(3)

[20]

Herguth A, Hahn G. Towards a high throughput solution for boron-oxygen related regeneration. In: 28th European Photovoltaic Solar Energy Conference and Exhibition, 2013, 1507–1511

[21]

Bothe K, Schmidt J. Fast-forming boron-oxygen-related recombination center in crystalline silicon. Applied Physics Letters, 2005, 87(26): 262108

[22]

Hashigami H, Dhamrin M, Saitoh T. Characterization of the initial rapid decay on light-induced carrier lifetime and cell performance degradation of Czochralski-grown silicon. Japanese Journal of Applied Physics, 2003, 42 (Part 1, No. 5A): 2564–2568

[23]

Inglese A, Lindroos J, Savin H. Accelerated light-induced degradation for detecting copper contamination in p-type silicon. Applied Physics Letters, 2015, 107(1): 41–46

[24]

Lindroos J, Yli-Koski M, Haarahiltunen A, Savin H. Room-temperature method for minimizing light-induced degradation in crystalline silicon. Applied Physics Letters, 2012, 101(23): 232108

[25]

Lindroos J, Savin H. Formation kinetics of copper-related light-induced degradation in crystalline silicon. Journal of Applied Physics, 2014, 116(23): 234901

[26]

Bothe K, Schmidt J. Electronically activated boron-oxygen-related recombination centers in crystalline silicon. Journal of Applied Physics, 2006, 99(1): 013701

[27]

Fertig F, Krauß K, Rein S. Light-induced degradation of PECVD aluminium oxide passivated silicon solar cells. Physica Status Solidi (RRL)-Rapid Research Letters, 2015, 9(1): 41–46

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Higher Education Press and Springer-Verlag Berlin Heidelberg

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