Unlocking the Potential of Rare Earth-Enriched Aluminum Oxo Clusters for Enhanced Dielectric Properties

Ruiduan Ji , Xiaoyu Liu , Haizhou Pei , Wei-Hui Fang , Weiguo Huang , Jian Zhang

Chinese Journal of Chemistry ›› 2025, Vol. 43 ›› Issue (9) : 1042 -1050.

PDF
Chinese Journal of Chemistry ›› 2025, Vol. 43 ›› Issue (9) : 1042 -1050. DOI: 10.1002/cjoc.202401181
Concise Report

Unlocking the Potential of Rare Earth-Enriched Aluminum Oxo Clusters for Enhanced Dielectric Properties

Author information +
History +
PDF

Abstract

This study highlights the innovative use of increased rare earth elements to enhance the dielectric properties of materials and devices. The AlOC-129Ln series, features the highest number of rare earth dopants in aluminum oxo clusters to date. The trivalent ions in AlOC-129Ln impart a high dipole moment, significantly elevating the dielectric constant (k) of the doped polymer films. AlOC-129Ce, in particular, exhibits the largest molecular size, which enhances interfacial effects and achieves a relative dielectric constant four times greater than that of undoped polymers and 1.5 times higher than those with single rare earth dopants. The substantial molecular size (~2.5 nm) and robust charge scattering and trapping capabilities of AlOC-129Ln reduce dielectric loss by up to 50% at high frequencies. Additionally, its excellent solution processability enhances breakdown strength by 147%, ensuring superior electrical stability. This research demonstrates the versatility of the cluster doping strategy in effectively balancing dielectric constant and loss, unveiling the promising potential of solution-processable cluster materials in electronic devices.

Keywords

Aluminum oxo cluster / Dopant / Dielectric constant / Electronic device / Ultra-low-power

Cite this article

Download citation ▾
Ruiduan Ji, Xiaoyu Liu, Haizhou Pei, Wei-Hui Fang, Weiguo Huang, Jian Zhang. Unlocking the Potential of Rare Earth-Enriched Aluminum Oxo Clusters for Enhanced Dielectric Properties. Chinese Journal of Chemistry, 2025, 43(9): 1042-1050 DOI:10.1002/cjoc.202401181

登录浏览全文

4963

注册一个新账户 忘记密码

References

RIGHTS & PERMISSIONS

2025 SIOC, CAS, Shanghai, & WILEY-VCH GmbH

AI Summary AI Mindmap
PDF

10

Accesses

0

Citation

Detail

Sections
Recommended

AI思维导图

/