Design, fabrication, and measurement of two silicon-based ultraviolet and blue-extended photodiodes

Changping Chen , Han Wang , Zhenyu Jiang , Xiangliang Jin , Jun Luo

Photonic Sensors ›› 2013, Vol. 4 ›› Issue (4) : 373 -378.

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Photonic Sensors ›› 2013, Vol. 4 ›› Issue (4) : 373 -378. DOI: 10.1007/s13320-014-0199-7
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Design, fabrication, and measurement of two silicon-based ultraviolet and blue-extended photodiodes

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Abstract

Two silicon-based ultraviolet (UV) and blue-extended photodiodes are presented, which were fabricated for light detection in the ultraviolet/blue spectral range. Stripe-shaped and octagon-ring-shaped structures were designed to verify parameters of the UV-responsivity, UV-selectivity, breakdown voltage, and response time. The ultra-shallow lateral pn junction had been successfully realized in a standard 0.5-μm complementary metal oxide semiconductor (CMOS) process to enlarge the pn junction area, enhance the absorption of UV light, and improve the responsivity and quantum efficiency. The test results illustrated that the stripe-shaped structure has the lower breakdown voltage, higher UV-responsicity, and higher UV-selectivity. But the octagon-ring-shaped structure has the lower dark current. The response time of both structures was almost the same.

Keywords

Ultraviolet/blue photodiode / ultraviolet responsivity / breakdown voltage / transient response / CMOS

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Changping Chen, Han Wang, Zhenyu Jiang, Xiangliang Jin, Jun Luo. Design, fabrication, and measurement of two silicon-based ultraviolet and blue-extended photodiodes. Photonic Sensors, 2013, 4(4): 373-378 DOI:10.1007/s13320-014-0199-7

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References

[1]

Charbon E. Towards large scale CMOS single-photon detector arrays for lab-on-chip applications. Journal of Physics D: Applied Physics, 2008, 41(9): 1-9.

[2]

Chang Y W, Yu P C, Huang Y T, Yang Y S. A CMOS-compatible optical biosensing system based on visible absorption spectroscopy. IEEE International Conference Electron Devices and Solid-State Circuits, Tainan, Dec. 20–22, 2007 1099-1102.

[3]

Pauchard A, Besse P A, Popovic R S. A silicon blue/UV selective stripe-shaped photodiode. Sens. Actuators, 1999, 76(1–3): 172-177.

[4]

Ghazi A, Zimmermann H A, Seegebrecht P. CMOS photodiode with enhanced responsivity for the UV/blue spectral range. IEEE Transactions on Electron Devices, 2002, 49(7): 1124-1128.

[5]

Pauchard A, Rochas A, Randjelovic Z, Besse P A, Popovic R S. Ultraviolet avalanche photodiode in CMOS technology. International Electron Devices Meeting 2000, San Francisco, USA, Dec. 10–13, 2000 709-712.

[6]

Chang Y W, Huang Y T. The ring-shaped CMOS-based phototransistor with high responsivity for the UV/blue spectral range. IEEE Photonics Technology Letters, 2009, 21(13): 899-901.

[7]

Li G, Feng P, Wu N. A novel monolithic ultraviolet image sensor based on a standard CMOS process. Journal of Semiconductors, 2011, 32(10): 105008-1-105008-6.

[8]

Endoh T, Hirose K, Shiraishi K. Physical origin of stress-induced leakage currents in ultra-thin silicon dioxide films. IEICE Transactions on Electronics, 2007, 90(5): 955-961.

[9]

Foland A D, Alexander J P, Hopman P I, Kim P C, Ward C W. Radiation-induced surface leakage currents in silicon microstrip detectors. IEEE Transactions on Nuclear Science, 1996, 43(3): 1746-1750.

[10]

Jellison G E, Withrow S P, McCamy J W, Budai J D, Lubben D, Godbole M J. Optical functions of ion-implanted, laser-annealed heavily doped silicon. Physical Review B, 1995, 52(20): 14607.

[11]

Jellison G E. Optical functions of silicon determined by two-channel polarization modulation ellipsometry. Optical Materials, 1992, 1(1): 41-47.

[12]

Vyatkin A F, Zinenko V I, Pustovit A N, Agafonov Y A. Ultra-shallow pn junction formation by ion implantation at high energy. IEEE Proceedings of the 14th International Conference on Ion Implantation Technology, Taos, USA, Sep. 22–27, 2002 594-596.

[13]

Hasumi M, Ukawa K, Sameshima T, Sano N, Naito M, Hamamoto N. Formation of shallow PN junction by cluster boron implantation and rapid annealing using infrared semiconductor laser. InAIP Conference Proceedings, 2011, 1321, 109.

[14]

Thorsten K, Wei A, Ostermay I. Shallow PN junction formed by in situ doping during selective growth of an embedded semiconductor alloy by a cyclic growth/etch deposition process, 2011

[15]

Inoue I, Tanaka N, Yamashita H, Yamaguchi T, Ishiwata H, Ihara H. Low-leakage-current and low-operating-voltage buried photodiode for a CMOS imager. IEEE Transactions on Electron Devices, 2003, 50(1): 43-47.

[16]

Jung J, Huang A Q. Improved breakdown- voltage complementary MOSFET in a 0.18 μm standard CMOS process for switch mode power supply (SMPS) applications. Proceedings of Power Semiconductor Devices & IC’s, Jun. 14–18, 2009 239-242.

[17]

Chou F P, Chen G Y, Wang C W, Li Z Y, Liu Y C, Huang W K, . Design and analysis for a 850 nm Si photodiode using the body bias technique for low-voltage operation. Journal of Lightwave Technology, 2013, 31(6): 936-941.

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