Plasma polymerized hexamethyldisilazane thin films in RF remote plasma system: effect of substrate distance from plasma source

Saker Saloum , Samer Abou Shaker

Optoelectronics Letters ›› 2025, Vol. 21 ›› Issue (10) : 601 -605.

PDF
Optoelectronics Letters ›› 2025, Vol. 21 ›› Issue (10) : 601 -605. DOI: 10.1007/s11801-025-4162-1
Original Paper
research-article

Plasma polymerized hexamethyldisilazane thin films in RF remote plasma system: effect of substrate distance from plasma source

Author information +
History +
PDF

Abstract

Organosilicone thin films were prepared through plasma polymerization (pp) in a plasma enhance chemical vapour deposition (PECVD) system, utilizing hexamethyldisilazane (HMDSN) as a monomer precursor, at varying distances (25 mm, 35 mm, 45 mm, 55 mm, and 65 mm) from the plasma source to the substrate. Research has examined how the distance between the substrate and plasma source impacts the properties of thin films, including their thickness, surface morphology, and photoluminescence (PL). It was discovered that as the distance increased, both film thickness and PL intensity also increased. Additionally, the film was observed to be more uniform and smoother when deposited 45 mm below the plasma source.

Keywords

A

Cite this article

Download citation ▾
Saker Saloum, Samer Abou Shaker. Plasma polymerized hexamethyldisilazane thin films in RF remote plasma system: effect of substrate distance from plasma source. Optoelectronics Letters, 2025, 21(10): 601-605 DOI:10.1007/s11801-025-4162-1

登录浏览全文

4963

注册一个新账户 忘记密码

References

RIGHTS & PERMISSIONS

Tianjin University of Technology

AI Summary AI Mindmap
PDF

32

Accesses

0

Citation

Detail

Sections
Recommended

AI思维导图

/