Optical properties of Ta₂O₅ single layer and ultraviolet reflective film under ultraviolet irradiation

Abstract

Tantalum pentoxide (Ta₂O₅) and ultraviolet reflective (UVR) multilayer films were deposited on quartz glass substrates by an electron beam evaporation system equipped with a hall ion source, respectively. The optical properties of Ta₂O₅ film and the UVR film under the vacuum ultraviolet irradiation were investigated. It is found that the mean transmittance of the Ta₂O₅ thin film decreased in the 300–500 nm region. The refractive index and extinction coefficient of the single layer increased during the range of 300–1 000 nm, with the variation rate of refractive index less than 1%, which is mainly due to the larger surface roughness and variation of the chemical state of Ta atoms on the surface caused by the irradiation. The mean reflectance of UVR film decreased from 96.5% to 95.4% during the range of 290–450 nm, indicating that the Ta₂O₅ and UVR films have excellent vacuum ultraviolet irradiation resistant properties.

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