A lattice measuring method based on integral imaging technology
Xiao-dong Zhang, Suo-yin Li, Zhi-guo Han, Lin Zhao, Fa-guo Liang, Ai-hua Wu
Optoelectronics Letters ›› 2021, Vol. 17 ›› Issue (5) : 313-316.
A lattice measuring method based on integral imaging technology
Aiming at the problem that the lattice feature exceeds the view field of the scanning electron microscope (SEM) measuring system, a new lattice measuring method is proposed based on integral imaging technology. When the system works, the SEM measuring system is equivalent to an integral image acquisition system. Firstly, a lattice measuring method is researched based on integral imaging theory. Secondly, the system parameters are calibrated by the VLSI lattice standard. Finally, the value of the lattice standard to be tested is determined based on the calibration parameters and the lattice measuring algorithm. The experimental results show that, compared with the traditional electron microscope measurement method, the relative error of the measured value of the algorithm is maintained within 0.2%, with the same level of measurement accuracy, but it expands the field of view of the electron microscope measurement system, which is suitable for the measurement of samples under high magnification.
[4] |
|
[2] |
Trache, A and Meininger G, Current Protocols in Microbiology 2, Unit 2C.2 (2008).
|
[3] |
|
[4] |
|
[5] |
|
[6] |
|
[7] |
|
[8] |
|
[9] |
|
[10] |
Tabery C, Morokuma H, Sugiyama A and Page L, Evaluation of OPC Quality Using Automated Edge Placement Error Measurement with CD-SEM, International Society for Optics and Photonics, 61521F (2006).
|
[11] |
Tanaka M, Meessen J, Shishido C, Watanabe K, Minnaert-Janssen I and Vanoppen P, CD Bias Reduction in CD-SEM Linewidth Measurements for Advanced Lithography, International Society for Optics and Photonics, 69221T (2008).
|
[12] |
|
/
〈 |
|
〉 |