A lattice measuring method based on integral imaging technology

Xiao-dong Zhang, Suo-yin Li, Zhi-guo Han, Lin Zhao, Fa-guo Liang, Ai-hua Wu

Optoelectronics Letters ›› 2021, Vol. 17 ›› Issue (5) : 313-316.

Optoelectronics Letters ›› 2021, Vol. 17 ›› Issue (5) : 313-316. DOI: 10.1007/s11801-021-0090-x
Article

A lattice measuring method based on integral imaging technology

Author information +
History +

Abstract

Aiming at the problem that the lattice feature exceeds the view field of the scanning electron microscope (SEM) measuring system, a new lattice measuring method is proposed based on integral imaging technology. When the system works, the SEM measuring system is equivalent to an integral image acquisition system. Firstly, a lattice measuring method is researched based on integral imaging theory. Secondly, the system parameters are calibrated by the VLSI lattice standard. Finally, the value of the lattice standard to be tested is determined based on the calibration parameters and the lattice measuring algorithm. The experimental results show that, compared with the traditional electron microscope measurement method, the relative error of the measured value of the algorithm is maintained within 0.2%, with the same level of measurement accuracy, but it expands the field of view of the electron microscope measurement system, which is suitable for the measurement of samples under high magnification.

Cite this article

Download citation ▾
Xiao-dong Zhang, Suo-yin Li, Zhi-guo Han, Lin Zhao, Fa-guo Liang, Ai-hua Wu. A lattice measuring method based on integral imaging technology. Optoelectronics Letters, 2021, 17(5): 313‒316 https://doi.org/10.1007/s11801-021-0090-x

References

[4]
AllanA. Journal of Applied Physics, 2015, 86: 045406
[2]
Trache, A and Meininger G, Current Protocols in Microbiology 2, Unit 2C.2 (2008).
[3]
ShenX, MarkmanA, JavidiB. Applied Optics, 2017, 56: D151
CrossRef Google scholar
[4]
KomatsuS, MarkmanA, MahalanobisA, ChenK, JavidiB. Appl. Opt., 2017, 9: D120
CrossRef Google scholar
[5]
WangY, YangJ, LiuL, YanP. Acta Optica Sinica, 2019, 39: 1110001 in Chinese)
CrossRef Google scholar
[6]
XiaoX, JavidiB, Martinez-CorralM, SternA. Applied Optics, 2013, 52: 546
CrossRef Google scholar
[7]
ChenX, SongX, WuJ, XiaoY, WangY. Optics and Lasers in Engineering, 2020, 136: 106314
CrossRef Google scholar
[8]
LiD, CheungC F, RenM, ZhouL, ZhaoX. Optics Express, 2014, 22: 25635
CrossRef Google scholar
[9]
ZhangH, DengH, HeM, WangQ. Applied Sciences, 2019, 9: 3852
CrossRef Google scholar
[10]
Tabery C, Morokuma H, Sugiyama A and Page L, Evaluation of OPC Quality Using Automated Edge Placement Error Measurement with CD-SEM, International Society for Optics and Photonics, 61521F (2006).
[11]
Tanaka M, Meessen J, Shishido C, Watanabe K, Minnaert-Janssen I and Vanoppen P, CD Bias Reduction in CD-SEM Linewidth Measurements for Advanced Lithography, International Society for Optics and Photonics, 69221T (2008).
[12]
Xiao-dongZ, BinW, Zhi-yuanY. Journal of Measurement Science & Instrumentation, 2017, 8: 238

Accesses

Citations

Detail

Sections
Recommended

/