Morphology of CIGS thin films deposited by single-stage process and three-stage process at low temperature

Jia-wei Zhang , Yu-ming Xue , Wei Li , Yan-min Zhao , Zai-xiang Qiao

Optoelectronics Letters ›› 2013, Vol. 9 ›› Issue (6) : 449 -453.

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Optoelectronics Letters ›› 2013, Vol. 9 ›› Issue (6) : 449 -453. DOI: 10.1007/s11801-013-3130-3
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Morphology of CIGS thin films deposited by single-stage process and three-stage process at low temperature

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Abstract

Cu(In,Ga)Se2 (CIGS) thin films are prepared by a single-stage process and a three-stage process at low temperature in the co-evaporation equipment. The quite different morphologies of CIGS thin films deposited by two methods are characterized by scanning electron microscopy (SEM). The orientation of CIGS thin films is identified by X-ray diffraction (XRD) and Raman spectrum, respectively. Through analyzing the film-forming mechanisms of two preparation processes, we consider the cause of such differences is that the films deposited by three-stage process at low temperature evolve from Cu-poor to Cu-rich ones and then back to Cu-poor ones. The three-stage process at low temperature results in the CIGS thin films with the (220)/(204) preferred orientation, and the ordered vacancy compound (OVC) layer is formed on the surface of the film. This study has great significance to large-scale industrial production.

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CuInSe / Solar Energy Material / IEEE Photovoltaic Specialist / GaAs Solar Cell / 17th European Photovoltaic Solar

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Jia-wei Zhang, Yu-ming Xue, Wei Li, Yan-min Zhao, Zai-xiang Qiao. Morphology of CIGS thin films deposited by single-stage process and three-stage process at low temperature. Optoelectronics Letters, 2013, 9(6): 449-453 DOI:10.1007/s11801-013-3130-3

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