Design and fabrication of a novel high damage threshold HfO2/TiO2/SiO2 multilayer laser mirror

Zeng-you Meng; Sha-ling Huang; Zhe Liu; Cheng-hang Zeng; Yi-kun Bu

doi:10.1007/s11801-012-1149-5

Optoelectronics Letters ›› 2012, Vol. 8 ›› Issue (3) : 190-192. DOI: 10.1007/s11801-012-1149-5

Article

Design and fabrication of a novel high damage threshold HfO₂/TiO₂/SiO₂ multilayer laser mirror

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Abstract

This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laserinduced damage threshold. The mirror is constructed by three materials of HfO₂/TiO₂/SiO₂ based on electric field and temperature field distribution characteristics of all-dielectric laser high reflector. TiO₂/SiO₂ stacks act as the high reflector (HR) and broaden the reflection bandwidth, while HfO₂/SiO₂ stacks are used for increasing the laser resistance. The HfO₂/TiO₂/SiO₂ laser mirror with 34 layers is fabricated by a novel remote plasma sputtering deposition. The damage threshold of zero damage probability for the new mirror is up to 39.6 J/cm² (1064 nm, 12 ns). The possible laser damage mechanism of the mirror is discussed.

Keywords

Electric Field Intensity / Damage Threshold / Damage Morphology / Laser Damage / Remote Plasma

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Zeng-you Meng, Sha-ling Huang, Zhe Liu, Cheng-hang Zeng, Yi-kun Bu. Design and fabrication of a novel high damage threshold HfO₂/TiO₂/SiO₂ multilayer laser mirror. Optoelectronics Letters, 2012, 8(3): 190‒192 https://doi.org/10.1007/s11801-012-1149-5

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This work has been supported by the National Natural Science Foundation of China (No.50802080) and the Natural Science Foundation of Fujian Province of China (No.2010J01349).