Fractal characteristics of far-field diffraction patterns for two-dimensional Thue-Morse quasicrystals

Ming-yang Yang , Jun Zhou , L. Petti , S. De Nicola , P. Mormile

Optoelectronics Letters ›› 2011, Vol. 7 ›› Issue (5) : 346 -349.

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Optoelectronics Letters ›› 2011, Vol. 7 ›› Issue (5) : 346 -349. DOI: 10.1007/s11801-011-1057-0
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Fractal characteristics of far-field diffraction patterns for two-dimensional Thue-Morse quasicrystals

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Abstract

We report a numerical method to analyze the fractal characteristics of far-field diffraction patterns for two-dimensional Thue-Morse (2-D TM) structures. The far-field diffraction patterns of the 2-D TM structures can be obtained by the numerical method, and they have a good agreement with the experimental ones. The analysis shows that the fractal characteristics of far-field diffraction patterns for the 2-D TM structures are determined by the inflation rule, which have potential applications in the design of optical diffraction devices.

Keywords

Intensity Distribution / Fractal Characteristic / Error Ratio / Input Plane / Random Defect

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Ming-yang Yang, Jun Zhou, L. Petti, S. De Nicola, P. Mormile. Fractal characteristics of far-field diffraction patterns for two-dimensional Thue-Morse quasicrystals. Optoelectronics Letters, 2011, 7(5): 346-349 DOI:10.1007/s11801-011-1057-0

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