Low voltage n-type OFET based on double insulators

Jian-lin Zhou, Fu-jia Zhang

Optoelectronics Letters ›› 2008, Vol. 4 ›› Issue (5) : 324-327.

Optoelectronics Letters ›› 2008, Vol. 4 ›› Issue (5) : 324-327. DOI: 10.1007/s11801-008-8029-z
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Low voltage n-type OFET based on double insulators

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Abstract

A top contact n-type organic field-effect transistor with low operating voltage was fabricated by employing Ta2O5/PMMA as the double insulators and PTCDI-C12 as the semiconductor active layer. The Ta2O5 layer was prepared by using simple economical anodization technique and the PMMA layer was prepared by using the spin-coating method. Compared with the OFET with single Ta2O5 insulator, the device with double insulators shows obviously better electrical performance. It has a field effect electron mobility of 0.063 cm2/Vs, an on/off ratio of 1.7×104 and a threshold voltage of 2.3 V.

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Jian-lin Zhou, Fu-jia Zhang. Low voltage n-type OFET based on double insulators. Optoelectronics Letters, 2008, 4(5): 324‒327 https://doi.org/10.1007/s11801-008-8029-z

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