Properties of ITO:Zr films deposited by co-sputtering

Abstract

ITO:Zr films were deposited on glass substrate by co-sputtering with an ITO target and a Zirconium target. Substrate temperature and oxygen flow rate have important influences on the properties of ITO:Zr films. ITO:Zr films show better crystalline structure and lower surface roughness. Better optical-electrical properties of the films can be achieved at low substrate temperature. The certain oxygen flow rates worsen the electrical properties but can enhance the optical properties of ITO:Zr films. The variation in optical band gap can be explained on the basis of Burstin-Moss effect.

References

[1] ZhongZ. Y., JiangY. D.. Appl. Surf. Sci., 2006, 253: 2102

[2] LacknerJ. M.. Thin Solid Films, 2006, 494: 302

[3] AukkaravittayapunS., WongtidaN., KasecwatinT., ChaojrochkulS., UnnanonK., ChindaudomP.. Thin Solid Films, 2006, 496: 117

[4] BesbesS., Ben OuadaH., DavenasJ., PonsonnetL., JaffrezicN., AlcouffeP.. Mater. Sci. Eng. C., 2006, 26: 505

[5] GregoryO. J., YouT., CrismanE. E.. Thin Solid Films, 2005, 476: 344

[6] MinamiT., YamamotoT., TodaY., MiyataT.. Thin Solid Films, 2000, 373: 189

[7] HsuC. M., LeeJ. W., MeenT. H., WuW. T.. Thin Solid Films, 2005, 474: 19

[8] TerziniE., ThilakanP., MinariniC.. Mater. Sci. Eng. B., 2000, 77: 110

[9] BiswasP. K., DeA., PramanikN. C., ChakrabortyP. K., OrtnerK., HockV., KorderS.. Mater Lett., 2003, 57: 2326

[10] HambergI., GranqvistC. G.. Sol. Energy Mater., 1986, 14: 241

[11] GuillenC., HerreroJ.. Vaccum, 2006, 80: 615