Design and fabrication of ultrasmall arrayed waveguide grating multiplexers based on Si nanowire waveguides

Dao-xin Dai , Liu Liu , Sheng Zhen , Sai-ling He

Optoelectronics Letters ›› 2007, Vol. 3 ›› Issue (1) : 7 -9.

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Optoelectronics Letters ›› 2007, Vol. 3 ›› Issue (1) :7 -9. DOI: 10.1007/s11801-007-6139-7
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Design and fabrication of ultrasmall arrayed waveguide grating multiplexers based on Si nanowire waveguides
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Abstract

The large refractive index difference between Si and SiO2 makes it possible to realize ultrasmall photonic integrated circuits. A 5 × 5 ultracompact arrayed waveguide grating multiplexer based on 500×250 nm Si nanowire waveguides is designed and fabricated by using the technologies of E-beam writing and amorphous-Si deposition. The measured channel spacing is about 1.5 nm (close to the design value) and the channel crosstalk is about −8 dB.

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Dao-xin Dai, Liu Liu, Sheng Zhen, Sai-ling He. Design and fabrication of ultrasmall arrayed waveguide grating multiplexers based on Si nanowire waveguides. Optoelectronics Letters, 2007, 3(1): 7-9 DOI:10.1007/s11801-007-6139-7

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