Phosphosilicate glass film for optical waveguide by sol-gel method

Abstract

In this paper, silica-on-silicon erbium-doped phosphosilicate glass film material was fabricated for optical waveguides by sol-gel method. Samples were characterized and analyzed. It is demonstrated that we have got-distributed, good translucent, alterable thickness of film and glass state erbiumdoped phosphosilicate films materials for optical waveguides by sol—gel method.

References

[1] DislichH., Angecoandt. Chem. ie, 1971, 10: 363-363

[2] JianpingPan, KaipingPeng, WenzheChen. Corrosion & Protection, 2001, 22: 339-339

[3] DesurvireE.. Erbium Doped Fiber Amplifiers., 1994, New York, Wiley

[4] SudoS.. Optical Fiber Amplifiers, Materials, Devices and Applications, 1997, Norwood, MA, Artech House

[5] HuangW., SymsR. R. A.Senior Member, IEEE. J. Light-wave Technol, 2003, 21: 1339-1339

[6] Le-tianZhang, Yuan-daWu, HuaXing, Ai-wuLi, WeiZheng, Guo-fanLiu, Yu-shuZhang. Journal Optoelectronics Laser, 2002, 13: 868-868

[7] DianovE. M., KoltashevV. V., PlotnichenkoV. G.. Journal of Non-Crystalline Solids, 1999, 249: 29-29

[8] D. Barbier,in Proc. OAA, Victoria Canada, July, 1997, 21.

[9] P. G. Kik, and A. Polman,MRS Bull., 1998, Apr, 48.

[10] SymsR. R. A., SchneiderV. M., HuangW., AhmadM. M.. Electron, Lett., 1997, 33: 1216-1216

[11] SymsR. R. A., SchneiderV., HuangW.. Electron. Lett., 1995, 31: 1833-1833

[12] HolmesA. S., SymsR. R. A., Ming.L. Appl. Opt., 1993, 32: 4916-4916