Lithography-free TiO2/HfO2/Cr/Ge/Mo multilayer for high-temperature infrared camouflage and heat dissipation

Kaihua ZHANG , Zhao LI , Zhiying CHEN , Xiaohu WU

Journal of Southeast University (English Edition) ›› 2026, Vol. 42 ›› Issue (1) : 131 -137.

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Journal of Southeast University (English Edition) ›› 2026, Vol. 42 ›› Issue (1) :131 -137. DOI: 10.3969/j.issn.1003-7985.2026.01.013
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Lithography-free TiO2/HfO2/Cr/Ge/Mo multilayer for high-temperature infrared camouflage and heat dissipation
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Abstract

To enhance the heat-dissipation capacity of infra-red (IR) stealth structures in high-temperature environments, a selective heat emitter with multi-band thermal management is fabricated. This emitter comprises a high-temperature-resistant titanium dioxide (TiO2)/hafnium dioxide (HfO2)/Cr/Ge/Mo multi-film-layer structure. Additionally, the thickness of each layer is determined by the transfer-matrix algorithm. The emissivity of the structure across the IR band is simulated, and its electric field distributions are analyzed across different wavelengths. The stealth-and heat-dissipation bands of the structure are calculated to confirm its overall stealth and heat-dissipation capabilities. The results reveal that the average emissivities of the fabricated TiO2/HfO2/Cr/Ge/Mo multi-film-layer structure decrease to 0.21 and 0.27 within 3-5 and 8-14 µm atmospheric window bands, respectively, achieving the IR concealment effect. Conversely, the average emissivities of the structure increase to 0.56 and 0.80 within the 2.5-3 and 5-8 μm non-atmospheric window (NAW) bands, respectively. These high-emissivity bands enhance radiative heat dissipation to reduce heat accumulation and further weaken the detection and characterization of thermal signals. The simulated thermal images confirm the IR-stealth effect of the structure within a wide temperature range. Moreover, its efficient NAW heat-dissipation capability improves its operating life in high-temperature environments.

Keywords

infrared camouflage / selective emitter / radiative heat dissipation / thermal management

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Kaihua ZHANG, Zhao LI, Zhiying CHEN, Xiaohu WU. Lithography-free TiO2/HfO2/Cr/Ge/Mo multilayer for high-temperature infrared camouflage and heat dissipation. Journal of Southeast University (English Edition), 2026, 42 (1) : 131-137 DOI:10.3969/j.issn.1003-7985.2026.01.013

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Funding

National Natural Science Foundation of China(52106099)

Science and Technology Development Joint Fund of Henan province(225200810077)

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