Resistive switching behavior of Ag/Mg0.2Zn0.8O/ZnMn2O4/p+-Si heterostructure devices for nonvolatile memory applications

Changcheng Wei , Hua Wang , Jiwen Xu , Yupei Zhang , Xiaowen Zhang , Ling Yang

Journal of Wuhan University of Technology Materials Science Edition ›› 2017, Vol. 32 ›› Issue (1) : 29 -32.

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Journal of Wuhan University of Technology Materials Science Edition ›› 2017, Vol. 32 ›› Issue (1) : 29 -32. DOI: 10.1007/s11595-017-1552-7
Advanced Materials

Resistive switching behavior of Ag/Mg0.2Zn0.8O/ZnMn2O4/p+-Si heterostructure devices for nonvolatile memory applications

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Abstract

The Ag/Mg0.2Zn0.8O/ZnMn2O4/p+-Si heterostructure devices were fabricated by sol-gel spin coating technique and the resistive switching behavior, conduction mechanism, endurance characteristic, and retention properties were investigated. A distinct bipolar resistive switching behavior of the devices was observed at room temperature. The resistance ratio R HRS/R LRS of high resistance state and low resistance state is as large as four orders of magnitude with a readout voltage of 2.0 V. The dominant conduction mechanism of the device is trap-controlled space charge limited current (SCLC). The devices exhibit good durability under 1×103 cycles and the degradation is invisible for more than 106 s.

Keywords

heterostructure / Ag/Mg0.2Zn0.8O/ZnMn2O4/p+-Si / devices / resistive switching properties

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Changcheng Wei, Hua Wang, Jiwen Xu, Yupei Zhang, Xiaowen Zhang, Ling Yang. Resistive switching behavior of Ag/Mg0.2Zn0.8O/ZnMn2O4/p+-Si heterostructure devices for nonvolatile memory applications. Journal of Wuhan University of Technology Materials Science Edition, 2017, 32(1): 29-32 DOI:10.1007/s11595-017-1552-7

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References

[1]

Waser R, Aono M. Nanoionics-based Resistive Switching Memories[J]. Nature Materials, 2007, 6(11): 833-840.

[2]

Qi J, Olmedo M, Ren J, et al. Resistive Switching in Single Epitaxial ZnO Nanoislands[J]. American Chemical Society, 2012, 6(2): 1051-1058.

[3]

He C L, Shi Z W, Zhang L C, et al. Multilevel Resistive Switching in Planar Graphene/SiO2 Nanogap Structures[J]. ACS Nano, 2012, 6(5): 4214-4221.

[4]

Moreno C, Munuera C, Valencia S, et al. Reversible Resistive Switching and Multilevel Recording in La0.7Sr0.3MnO3 Thin Films for Low Cost Nonvolatile Memories[J]. Nano Letters, 2010, 10(10): 3828-3835.

[5]

Dong R, Wang Q, Chen L D, et al. Retention Behavior of the Electric-pulse-induced Reversible Resistance Change Effect in Ag-La0.7Ca0.3MnO3-Pt Sandwiches[J]. Appl. Phys. Lett., 2005, 86(17): 172107

[6]

Choi B J, Jeong D S, Kim S K, et al. Resistive Switching Mechanism of TiO2 Thin Films Grown by Atomic-layer Deposition[J]. J. Appl. Phys., 2005, 98(3): 033715

[7]

Shang D S, Wang Q, Chen L D, et al. Effect of Carrier Trapping on the Hysteretic Current-voltage Characteristics in Ag/La0.7Ca0.3MnO3/Pt Heterostructures [J]. Phys. Rev. B, 2006, 73(24): 245427

[8]

Waser R, Dittmann R, Staikov G, et al. Redox-based Resistive Switching Memories-nanoionic Mechanisms, Prospects, and Challenges[J]. Adv. Mate., 2009, 21: 2632-2663.

[9]

Lai Y S, Tu C H, Kwong D L, et al. Bistable Resistance Switching of Poly (N-vinylcarbazole) Films for Nonvolatile Memory Applications[J]. Appl. Phys. Lett., 2005, 87(12): 122101

[10]

Chen X M, Zhou H, Wu G H, et al. Colossal Resistive Switching Behavior and Its Physical Mechanism of Pt/p-NiO/n-Mg0.6Zn0.4O/Pt Thin Films[J]. Appl. Phys. A, 2008, 93: 093501.

[11]

Peng H, Wu T. Nonvolatile Resistive Switching in Spinel ZnMn2O4 and Ilmenite ZnMnO3[J]. Appl. Phys. Lett., 2009, 95: 152106.

[12]

Chen X M, Wu G H, Bao D H. Resistive Switching Behavior of Pt/Mg0.2Zn0.8O/Pt Devices for Nonvolatile Memory Applications[J]. Appl. Phys. A, 2011, 104(1): 477-481.

[13]

Liu Q, Guan W H, Long S B, et al. Resistive Switching Memory Effect of ZrO2 Films with Zr+ Implanted[J]. Appl. Phys. Lett., 2008, 92(1): 012117

[14]

Kim S H, Jeong H Y, Choi S Y, et al. Comprehensive Modeling of Resistive Switching in the Al/TiOx/TiO2/Al Heterostructure Based on Space-Charge-Limited Conduction[J]. Appl. Phys. Leet., 2010, 97(3): 033508

[15]

Gao S M, Wang H, Xu J W, et al. Effect of Annealing Temperature on Resistance Switching Behavior of Mg0.2Zn0.8O Thin Films Deposited on ITO Glass[J]. Solid-State Electronics, 2012, 76: 41-43.

[16]

Tian H F, Zhao Y G, Jiang X L, et al. Resistance Switching Effect in LaAlO3/Nb-doped SrTiO3 Heterostructure[J]. Appl. Phys. A, 2011, 102(10): 939-942.

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