Morphology study of oriented SmBCO film deposited by MOCVD

Abstract

c-axis-oriented SmBa₂Cu₃O₇ (SmBCO) films have been deposited on (100)- LaAlO₃ (LAO) substrate by metal organic chemical vapor deposition (MOCVD) technique. The effects of deposition temperature (T _dep) and total pressure (P _tot) on the orientation and microstructure of SmBCO films were investigated. The orientation of SmBCO films transformed from a-axis to c-axis with increasing of T _dep from 900 to 1 100 °C. At T _dep = 1 050 °C, SmBCO films had c-axis orientation and tetragon surface. At P _tot= 400-800 Pa and T _dep = 1 050 °C, totally c-axis-oriented SmBCO films were obtained. The R _dep of SmBCO films increased firstly and then decreased with increasing P _tot. The surface of SmBCO films exhibited tetragon morphology at 1 050 °C and 400 Pa. Maximum thickness of SmBCO film deposited was 1.2 μm at P _tot = 600 Pa, and the corresponding R _dep was 7.2 μm·h^-1.

Keywords

SmBCO film / MOCVD / orientation / morphology

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