Development of electrospray laser chemical vapour deposition for homogenous alumina coatings

Teiichi Kimura

doi:10.1007/s11595-016-1321-z

Journal of Wuhan University of Technology Materials Science Edition ›› 2016, Vol. 31 ›› Issue (1) : 11 -14. DOI: 10.1007/s11595-016-1321-z

Advanced Films and Coatings

Development of electrospray laser chemical vapour deposition for homogenous alumina coatings

Teiichi Kimura ¹^,²^,^{^a}

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Abstract

Electrospray, as a liquid source supply system, has been applied to chemical vapour deposition (CVD). In thermal CVD, the microstructure of the obtained films changes from dense to coarse granular because of the decreasing surface temperature during deposition. Using the electrospray laser chemical vapour deposition method, we prepared homogenous alumina coatings. We found that laser irradiation was effective in compensating the surface temperature decrease, and an alpha-alumina coating with dense columnar microstructures was obtained at a deposition rate of 200 μm/h using 200 W Nd:YAG laser irradiation.

Keywords

electrospray laser chemical vapour deposition / homogenous Alumina / coating

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Teiichi Kimura. Development of electrospray laser chemical vapour deposition for homogenous alumina coatings. Journal of Wuhan University of Technology Materials Science Edition, 2016, 31(1): 11-14 DOI:10.1007/s11595-016-1321-z

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