Effect of additives on the morphologies of cuprous oxides by electrodeposition

Abstract

Cuprous oxides with different morphologies were formed on F-doped tin oxide (FTO) covered glass substrates by potentiostatic deposition of cupric acetate. The effects of CTAB and Cl⁻ on the crystal morphologies of cuprous oxide were studied. Different crystal morphologies of cuprous oxides were obtained by the change of the concentrations of CTAB and Cl. The flowerlike and cubic morphologies of Cu₂O crystals were obtained when using higher concentration of CTAB and KCl, respectively. Photoelectrochemical properties of the Cu₂O thin films prepared in the system were also studied.

Keywords

crystal morphology / electrochemical growth / thin film / cuprous oxide

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