Optical, mechanical and laser-induced damage threshold properties of 1 064 nm, 532 nm frequency-doubled antireflection coating for LBO

Abstract

1 064 nm, 532 nm frequency-doubled antireflection (AR) coatings with buffer layer of SiO₂ between the coating and the substrate were fabricated by the electron beam evaporation technology on the substrate of lithium triborate (LiB₃O₅ or LBO) crystals. The residual reflectance of the sample is 0.07% and 0.11% at 1 064 nm and 532 nm, respectively. The adhesion and the laser-induced damage threshold (LIDT) of the sample are greater than 200 mN and 18.6 J/cm². The strengthening mechanism of adhesion and LIDT of the buffer layer of SiO₂ were discussed by considering full plastic indentation and shear theory, and spallation of a plated film induced by thermal shock stress, respectively.

Keywords

frequency-doubled AR coating / LBO / adhesion / LIDT / buffer layer

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