Structure characterization of F-doped silica glass

Junlin Xie; Tao Deng; Feng Tu; Jie Luo; Qingrong Han

doi:10.1007/s11595-009-1137-1

Journal of Wuhan University of Technology Materials Science Edition ›› 2009, Vol. 24 ›› Issue (1) : 137 -139. DOI: 10.1007/s11595-009-1137-1

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Structure characterization of F-doped silica glass

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Abstract

Pure and fluorine-doped silica glass were fabricated by plasma chemical vapour deposition (PCVD) and characterized using Raman and infrared spectrum. The change in Raman intensity of 945 cm⁻¹ peak, relating to ≡Si—F stretching vibration, agrees with the change of F content. Compared with measured wavenumber in IR spectrum, the calculated absorption wavelength confirms the incorporation form of F into the glass, the detail of which is a tetrahedron with a Si atom in the center coupled with one F atom and three network O atoms. Such structure identification may be useful for explaining some properties of F-doping silica glass.

Keywords

silica glass / fluorine / PCVD / incorporation form

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Junlin Xie, Tao Deng, Feng Tu, Jie Luo, Qingrong Han. Structure characterization of F-doped silica glass. Journal of Wuhan University of Technology Materials Science Edition, 2009, 24(1): 137-139 DOI:10.1007/s11595-009-1137-1

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