Photocatalytic activities of amorphous TiO₂-Cr thin films prepared by magnetron sputtering

Abstract

Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method. The films deposited on glass slides at room temperature were investigated by atom force microscope, X-ray diffractometer, X-ray photoelectron spectroscopy, UV-Vis spectrophotometer, the photoluminescence (PL) and ellipse polarization apparatus. The results indicate that TiO₂-Cr film exists in the form of amorphous. The prepared films possess a band gap of less than 3.20 eV, and a new absorption peak. The films, irradiated for 5 h under UV light, exhibit excellent photocatalytic activities with the optimum decomposition rate at 98.5% for methylene blue. Consequently, the thickness threshold on these films is 114 nm, at which the rate of photodegradation is 95% in 5 h. When the thickness is over 114 nm, the rate of photodegradation becomes stable. This result is completely different from that of crystalloid TiO₂ thin film.

Keywords

amorphous TiO₂ / magnetron sputtering / TiO₂-Cr thin films / photocatalysis / threshold

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