Nano-sized thin films fabricated by ion beam sputtering and its properties

Abstract

Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorphous to crystalline state. The film thickness was measured with α-stylus surface profiler, the structure and the compositions of the films were confirmed by low angle X-ray diffraction and scanning auger electron microprobe respectively, and the surface topography was characterized by scanning electron microscope and scanning probe microscope. Electrical property of the films was measured by four-point probe. The experimental results illustrate that the combined processes of ion beam sputtering and rapid thermal process are effective for fabrication nanoscale Ni-Cr alloy thin film with good properties.

Keywords

ion beam sputtering deposition film / rapid thermal process / nanoscale NiCr thin film

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